Resistance change memory device for storing information in a non-volatile manner by changing resistance of memory material

ABSTRACT

A resistance change memory device including a substrate, first and second wiring lines formed above the substrate to be insulated from each other, and memory cells disposed between the first and second wiring lines, wherein the memory cell includes: a variable resistance element for storing as information a resistance value; and a Schottky diode connected in series to the variable resistance element. The variable resistance element has: a recording layer formed of a composite compound containing at least one transition element and a cavity site for housing a cation ion; and electrodes formed on the opposite sides of the recording layer, one of which serves as a cation source in a write or erase mode for supplying a cation to the recording layer to be housed in the cavity site therein.

CROSS REFERENCE TO RELATED APPLICATION

This application is a Continuation of application Ser. No. 11/761,758filed Jun. 12, 2007, the contents of which are herein incorporated byreference in their entirety.

BACKGROUND OF THE INVENTION

1. Field of the Invention

This invention relates to a resistance change memory device, whichstores a resistance value determined due to resistance change of memorymaterial in a non-volatile manner.

2. Description of the Related Art

Prior known electrically rewritable semiconductor memory devices aregenerally categorized into volatile memories and nonvolatile memories.Whereas volatile memories include DRAMs and SRAMs, nonvolatile memoriesinclude EEPROM flash memories such as those of the NAND or NOR type orthe like. The DRAMs and SRAMs are featured by high-speed randomaccessibility; the flash memories feature large capacity and long-termdata retainability. The ones with nonvolatility which are capable ofoffering high-speed random accessibility also include ferro-electricRAMs using ferroelectric films. In these prior art semiconductormemories, they must have, without fail, transistors for use as theconstituent parts or components thereof.

In a cell array configuration which is deemed ideal for use with RAMs,the use of rows and columns of select signal lines is inevitable as faras the cell array is organized into the form of a row/column matrix. Ifno wiring lines other than these row/column select lines are formed,then the cell array becomes simpler in configuration; however, in theprior art semiconductor memories, the cell array has been configuredwith increased complexities as a result of addition of power supplylines and data lines other than the cell array becomes simpler inconfiguration; however, in the prior art semiconductor memories, thecell array has been configured with increased complexities as a resultof addition of power supply lines and data lines other than theabove-noted signal lines. Additionally, memory cells are such that whenminiaturization further progresses, it is difficult to maintain thecharacteristics thereof.

From these viewpoints, cells which utilize the nature of compositionmatter per se as a data state are expected to become more important inadvanced memory technologies of the next generation in near future. As apromising one adaptable for use in such technologies, there has beenproposed a phase-change or ovonic memory which utilizes a phasetransition between crystalline and amorphous states of achalcogenide-based glass material. The memory of this type utilizes thefact that a resistance ratio of the amorphous state to the crystallinestate of the chalcogenide is as large as 100:1 or more to store thereinsuch different resistance value states as information.

The chalcogenide glass has already been used in rewritable optical disksor else. Here, a difference of the refractivity of chalcogenide due to aphase change is used. This phase change is reversible, and any changecan be controlled by adequately designing the way of heating, whereinthe heating technique is controllable by the amount of a current flowingin this material. A trial for memory cells utilizing the feature of thismaterial has been reported (for example, see Jpn. J. Appl. Phys. Vol. 39(2000) PP. 6157-6161 Part 1, NO. 11, November 2000 “SubmicronNonvolatile Memory Cell Based on Reversible Phase Transition inChalcogenide Glasses” Kazuya Nakayama et al).

SUMMARY OF THE INVENTION

A resistance change memory device in accordance with an aspect of thepresent invention including: a substrate; first wiring lines formedabove the substrate; second wiring lines formed above the substrate tocross the first wiring lines as being electrically insulated therefrom;and memory cells disposed at respective crossing points of the firstwiring lines and the second wiring lines, one ends thereof beingconnected to the first wiring lines while the other ends are connectedto the second wiring lines, wherein the memory cell includes:

a variable resistance element for storing as information a resistancevalue; and

a Schottky diode connected in series to the variable resistance element,and wherein the variable resistance element has:

a recording layer formed of a composite compound containing at least onetransition element and a cavity site for housing a cation ion; and

electrodes formed on the opposite sides of the recording layer, one ofthe electrodes serving as a cation source in a write or erase mode forsupplying a cation to the recording layer to be housed in the cavitysite therein.

A resistance change memory device in accordance with another aspect ofthe present invention including: a semiconductor substrate;semiconductor layers formed in the semiconductor substrate so that theseare arrayed in a matrix form while being partitioned by an elementisolation dielectric film; diodes each formed at its correspondingsemiconductor layer with a metal electrode as a terminal electrode, themetal electrode being formed at part of a surface of each thesemiconductor layer; first wiring lines provided to commonly connect thediodes as arrayed in one direction of the matrix; an interlayerdielectric film covering the first wiring lines; metal plugs buried inspace portions of the first wiring lines of the interlayer dielectricfilm and being in ohmic contact with each the semiconductor layer;variable resistance elements with a recoding layer formed above theinterlayer dielectric film to have a bottom surface in contact with themetal plugs; and second wiring lines provided to cross the first wiringlines while being in contact with an upper surface of the recordinglayer, wherein the variable resistance element includes:

a recording layer formed of a composite compound containing at least onetransition element and a cavity site for housing a cation ion; and

electrodes formed on the opposite sides of the recording layer, one ofthe electrodes serving as a cation source in a write or erase mode forsupplying a cation to the recording layer to be housed in the cavitysite therein.

A resistance change memory device in accordance with another aspect ofthe present invention including: an insulative substrate; first wiringlines formed above the insulative substrate; memory cells being formedover each the first wiring line so that one end is connected to each thefirst wiring line, each the memory cell having a stacked structure of avariable resistance element and a diode, the variable resistance elementstoring as information a resistance value; and second wiring linesformed over the memory cells to commonly connect together the other endportions of the memory cells arrayed in a direction crossing the firstwiring lines, wherein the variable resistance element includes:

a recording layer formed of a composite compound containing at least onetransition element and a cavity site for housing a cation ion; and

electrodes formed on the opposite sides of the recording layer, one ofthe electrodes serving as a cation source in a write or erase mode forsupplying a cation to the recording layer to be housed in the cavitysite therein.

A resistance change memory device in accordance with another aspect ofthe present invention including an insulative substrate and a pluralityof memory cell arrays stacked over the insulative substrate, whereineach the memory cell array includes:

first wiring lines extending in parallel with each other;

memory cells formed above the first wiring lines in such a manner thatone ends are connected to the first wiring lines, the memory cellcomprising a stacked structure of a variable resistance element and adiode, the variable resistance element storing as information aresistance value; and

second wiring lines formed above the memory cells to commonly connectthe other ends of the memory cells arrayed in a direction crossing thefirst wiring lines, and wherein the variable resistance element has:

a recording layer formed of a composite compound containing at least onetransition element and a cavity site for housing a cation ion; and

electrodes formed of the opposite sides of the recording layer, one ofthe electrodes serving as a cation source in a write or erase mode forsupplying a cation to the recording layer to be housed in the cavitysite therein.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a diagram showing an equivalent circuit of a cell array inaccordance with an embodiment of this invention.

FIG. 2 is a plan view diagram of same cell array.

FIG. 3A is a cross-sectional diagram as taken along line I-I′ of FIG. 2.

FIG. 3B is a sectional diagram taken along line II-II′ of FIG. 2.

FIG. 3C is a sectional diagram along line III-III′ of FIG. 2.

FIG. 4 is a sectional diagram of a substrate for explanation of amanufacturing process of the cell array.

FIG. 5 is a diagram showing an element isolation process step of thesame.

FIG. 6 is a sectional diagram showing a formation process of diodes andword lines of the same.

FIG. 7 is a sectional diagram showing a process for formation of aninterlayer dielectric film and for contact formation of the same.

FIG. 8 is a sectional diagram showing a metal plug burying process ofthe same.

FIG. 9 is a sectional diagram showing a process for forming achalcogenide layer and bit lines of the same.

FIG. 10 is a sectional diagram showing another cell array structure in away corresponding to FIG. 3A.

FIG. 11 is a sectional diagram showing still another cell arraystructure in a way corresponding to FIG. 3A.

FIG. 12 is a sectional diagram showing yet another cell array structurein a way corresponding to FIG. 3A.

FIG. 13 is a sectional diagram showing a further another cell arraystructure in a way corresponding to FIG. 3A.

FIG. 14 is a plan view of another cell array.

FIG. 15A is a sectional diagram along line I-I′ of FIG. 14.

FIG. 15B is a sectional diagram along line II-II′ of FIG. 14.

FIG. 16 is a sectional diagram showing a word-line formation step in thefabrication process of the cell array.

FIG. 17 is a sectional diagram showing a diode formation process step ofthe same.

FIG. 18 is a sectional diagram showing a diode isolation step of thesame.

FIG. 19 is a sectional diagram showing a planarization step using aninterlayer dielectric film of the same.

FIG. 20 is an equivalent circuit diagram showing a stacked structureexample of a cell array with shaped bit lines.

FIG. 21 is an equivalent circuit diagram showing another stackedstructure example of a cell array with shaped bit lines.

FIG. 22 is an equivalent circuit diagram showing still another stackedstructure example of a cell array with shaped bit lines.

FIG. 23 is a sectional diagram showing a stacked cell array structurecorresponding to FIG. 20.

FIG. 24 is a sectional diagram showing a stacked cell array structurecorresponding to FIG. 21.

FIG. 25 is a sectional diagram showing a stacked cell array structurecorresponding to FIG. 22.

FIG. 26 is a sectional diagram showing a stacked structure of a cellarray without shaped wiring lines.

FIG. 27 is an equivalent circuit diagram showing a stacked structureexample of a cell array with shared word lines.

FIG. 28 is a sectional diagram showing a stacked cell array structurecorresponding to FIG. 27.

FIG. 29 is a diagram showing a configuration of a bit line and word lineselecting circuit of the cell array.

FIG. 30 is a diagram showing a basic configuration of a sense amplifiercircuit used in the embodiment.

FIG. 31 is a diagram showing a configuration of a sense amplifiercircuit in the case of performing four-value storage by means oftwo-layer stacked cell arrays.

FIG. 32 is a truth value table for explanation of an operation of thesense amplifier circuit of FIG. 30.

FIG. 33 is a truth value table for explanation of an operation of thesense amp circuit of FIG. 31.

FIG. 34 is an equivalent circuit diagram of three-layer stacked cellarrays.

FIG. 35 is a diagram showing a configuration of a sense amp circuit inthe case of performing eight-value storage by means of three-layerstacked cell arrays.

FIG. 36 is a truth value table for explanation of an operation of thesense amp circuit of FIG. 35.

FIG. 37 is a diagram showing a configuration of a sense amp circuitwhich is an improved version of the sense amp circuit of FIG. 35.

FIG. 38 is a truth value table for explanation of an operation of thesense amp circuit of FIG. 37.

FIG. 39 is a truth value table for explanation of an operation in thecase of applying part of the sense amp circuit of FIG. 37 to four-valuestorage.

FIG. 40 is an equivalent circuit diagram of a four-layer stacked cellarrays.

FIG. 41 is a truth value table for explanation of an operation in thecase of applying the sense amp circuit scheme of FIG. 35 tosixteen-value storage using four-layered stacked cell arrays.

FIG. 42 is a diagram showing a configuration of a sense amp circuitpreferable for 16-value storage by means of four-layer stacked cellarrays.

FIG. 43 is a truth value table for explanation of a 16-value storageoperation using the sense amp circuit of FIG. 42.

FIG. 44 is a diagram showing another sense amp circuit scheme foravoidance of degeneration or degeneracy.

FIG. 45 is a diagram showing a sense amp circuit scheme preferable fordegeneracy avoidance.

FIG. 46 is a diagram showing a pulse generation circuit in the case of4-value storage by means of a two-layer stacked cell arrays.

FIG. 47 is a diagram showing write pulses owing to the write pulsegeneration circuit.

FIG. 48 is a diagram showing a practically implemented configuration ofthe write pulse generator circuit.

FIG. 49 is a diagram showing write pulses (with degeneracy) of 8-valuedata by means of three-layer stacked cell arrays.

FIG. 50 is a diagram showing 8-value data write pulses (withoutdegeneracy) by means of three-layer stacked cell arrays.

FIG. 51 is a diagram showing a configuration of a write circuit forgeneration of the write pulses of FIG. 50.

FIG. 52 is a diagram showing write pulses in the case of applying thewrite pulse scheme of FIG. 50 to 4-value data writing.

FIG. 53 is a diagram showing a configuration of a write circuit forgeneration of the write pulses of FIG. 52.

FIG. 54 is a diagram showing 16-value data write pulses by means offour-layer stacked cell arrays.

FIG. 55 is a diagram showing a configuration of a write circuit forgeneration of the write pulses of FIG. 54.

FIG. 56 is a diagram for explanation of a relationship of a write/readscheme of phase-change memory cells versus power consumption due todata.

FIG. 57 is a diagram showing a configuration of a pulse voltage boostercircuit for selectively voltage-raising or “boosting” write pulses.

FIG. 58 is a waveform diagram for explanation of a boost operation ofthe pulse booster circuit.

FIG. 59 is a diagram showing a cell block structure for data searchfacilitation of four-layered cell arrays.

FIG. 60 is a diagram showing a configuration of a bit line selectorcircuit of a cell block.

FIG. 61 is a diagram showing a configuration of a word line selectorcircuit of the cell block.

FIG. 62 is a diagram for explanation of a first data search mode of acell block.

FIG. 63 is a diagram for explanation of a second data search mode of thecell block.

FIG. 64 is a diagram for explanation of a third data search mode of thecell block.

FIG. 65 is a diagram showing a configuration of a preferable writecircuit of the cell block.

FIG. 66 is a diagram showing write pulse waveforms by means of the samewrite circuit.

FIG. 67 is an equivalent circuit showing a memory cell arrangement ofanother multiple-value phase-change or “ovonic” memory.

FIG. 68 is a diagram showing write pulses of the memory cell.

FIG. 69 is a plan view of the memory cell array.

FIG. 70 is a sectional diagram along I-I′ of FIG. 69.

FIG. 71 is an equivalent circuit showing a memory cell configuration ofanother multi-value ovonic memory.

FIG. 72 is a sectional diagram showing a structure with multi-valuestorage cell of FIG. 71 stacked.

FIG. 73 is an equivalent circuit of the stacked structure.

FIG. 74 is a sectional diagram showing another structure with themulti-value storage cell of FIG. 71 stacked.

FIG. 75 is a diagram showing a variable resistance element and recordingoperation thereof in accordance with another embodiment.

FIG. 76 shows a preferable electrode structure of the element.

FIGS. 77A to 77C each shows the element structure with a heater layer(s)disposed.

FIGS. 78 to 83 show compound examples usable in this embodiment.

DETAILED DESCRIPTION OF THE EMBODIMENTS

An explanation will be given of embodiments of this invention below.

FIG. 1 shows a cell array of a phase-change memory in accordance with anembodiment, with respect to a 3×3 cell matrix. A plurality of firstwiring lines (referred to as word lines hereinafter) WL are provided inparallel, and a plurality of second wiring lines (referred tohereinafter as bit lines) BL are provided to cross over the first lines.

Memory cells MC are laid out at the respective crossing points of theselines. The memory cell MC is a series-connection circuit of a variableresistive element VR and a diode SD. The variable resistive element VRis formed of chalcogenide and is operable to store therein a resistancevalue determined due to a phase transition between its crystalline andamorphous states as information in a nonvolatile manner.

Although the diode SD is a Schottky diode in the case of thisembodiment, a pn-junction diode is alternatively usable. One end of thememory cell MC is connected to a bit line BL, and the other end isconnected to a word line WL. Although in the drawing the diode SD issuch that the word line WL side is an anode, it is also possible toreverse the polarity of diode SD because what is required here is toobtain the cell selectivity based on a voltage potential relationship ofthe word line WL versus the bit line BL. Further, it is also possible tochange the position of the diode SD and the variable resistive elementVR.

As previously stated, data is to be stored as the significance of aresistance value of the resistive element VR of each memory cell MC. Forinstance, in a non-select state, let all the word lines WL be set at “L”level while setting all the bit lines BL at “H” level.

One example is that “H” level is equal to 1.8V and “L” is 0V. In thisnonselect state, the diodes SD of all memory cells MC are in areverse-bias state and thus are in an off-state; thus, no currents flowin the resistive elements VR. Considering the case of selecting acentrally located memory cell MC of the cell array of FIG. 1, which issurrounded by broken lines, let a selected word line WL at “H” whilesetting a selected bit line BL at “L”. Whereby, at the selected cell,its diode SD becomes forward-biased allowing a current to flow therein.

The amount of a current flowing in the selected cell at this time isdetermined by the phase of the chalcogenide constituting the resistiveelement VR; thus, it is possible to read two-value or binary data bydetecting whether the current amount is large or small. Also note thatit is possible to permit creation of a phase transition in thechalcogenide of the resistive element VR by making higher the “H” levelpotential of the selected word line to thereby likewise increase thecurrent amount and then utilizing the heat-up of a cell portion due tothis current, by way of example. Thus, it is possible to select aspecific cell in the cell array and then rewrite information of suchcell.

In this way, in the cell array of this embodiment, access is performedonly by potential level setup of a single word line WL and a single bitline BL. Although in the case of a transistor provided for cellselection a signal line for selecting the gate of the transistor isrequired within the cell array, no such signal line is necessary in thisembodiment. In addition, in view of the fact that diodes are inherentlysimpler in structure than transistors, the cell array becomes moresimplified in configuration owing to a decrease in requisite number ofsignal lines in combination with the simple diode structure advantage,thus enabling achievement of higher integration of the cells.

Regarding the diode SD used for cell selection, the use of a Schottkydiode in particular results in that many effects are obtained. First,unlike pn-junction diodes, the Schottky diode is a majority carrierdevice so that accumulation of minority carriers hardly occurs in anyway, thereby enabling high-speed accessing. Second, both the cell arrayconfiguration and the manufacturing or fabrication process thereofbecome simplified because there is no need to form any pn junctions.Third, whereas pn junctions are faced with problems as to unwantedchanges in characteristics due to temperatures, Schottky junctions arestable against temperatures.

Although in the above operation explanation one specific case forcontrolling the potential levels of word lines WL and bit lines BL tothereby perform resistance value detection (data read) of thechalcogenide making up the resistive element VR and also thephase-change control (data rewrite) was indicated, read and rewrite mayalso be performed by controlling the levels of currents flowing in theword lines WL and bit lines BL.

These voltage control scheme and current control scheme are differentfrom each other in energy being given to the chalcogenide during readingof the resistance value. This can be the because the chalcogenide ishigh in resistance value in its amorphous state and low in resistance inthe crystalline state thereof.

More specifically, when letting the resistance of chalcogenide berepresented by R, the power to be generated in the chalcogenide becomesequal to v2/R if the voltage potential control is employed, and is givenas iR2 if the current control is used.

Due to this, the both schemes are different in influence upon a phasechange of a temperature change of the chalcogenide being presentlysubjected to resistance detection. Accordingly, either one scheme may bechosen by taking account of the cell structure and/or the stability asgiven to the chalcogenide's phase state.

An explanation will next be given of several examples each of whichactually arranges the cell array of FIG. 1 as a semiconductor integratedcircuit. FIG. 2 illustrates a plan view of a cell array of one exampleof them; FIGS. 3A, 3B and 3C show its cross-sections as taken alonglines I-I′, II-II′ and III-III′ of FIG. 2, respectively.

In the case of this embodiment, a substrate 10 is a p-type siliconsubstrate having its surface portion in which an n-type silicon layer 12is formed, which is partitioned by an element isolation dielectric film11 in units of respective memory cell areas. With respect to a pluralityof n-type silicon layers 12 which are aligned in one direction, wordlines (WL) 21 that are formed of a metal film are continuously formed sothat these are offset to one side of the surface thereof.

Each Schottky diode SD is formed with the word line 21 as an anodeelectrode (Schottky electrode), and with the n-type silicon layer 12 asa cathode layer. Note however that the metal film making up the wordlines WL and Schottky junctions may be separate ones; for example, it isalso possible to form patterned metal films for constructing theSchottky junctions only in the respective cell areas and then performword-line formation in such a manner as to commonly connect themtogether.

The plane on which the word lines 21 are formed is planarly covered withan interlayer dielectric film 22. And, at space portions between theword lines 21 of this interlayer dielectric film 22, contact holes aredefined which reach the n-type silicon layers 12: at these portions,metal plugs 23 for use as the cathode electrodes of diodes SD areburied.

From the contact holes with the metal plugs 23 buried therein, animpurity is pre-diffused into the n-type silicon layers 12 wherebyn⁺-type layers 26 are formed, which are for obtaining good ohmiccontact.

Further on the interlayer dielectric film 22 with metal plugs 23planarly buried therein, a chalcogenide layer 24 is formed; on thislayer, bit lines (BL) 25 formed of a metal film are formed. Portions(meshed regions in FIGS. 3A and 3B) at which the buried metal plugs 23of the chalcogenide layer 24 oppose the bit lines 25 become phase-changeregions (i.e. variable resistive elements) VR which actually function asthe cell regions.

A fabrication process of such the cell array will be explained withreference to FIGS. 4 to 9, while giving attention to the cross-section(I-I′ cross-section) of FIG. 3A. FIG. 4 shows a wafer with an n-typelayer 12 formed at a surface portion of the p-type silicon substrate 10.With respect to this wafer, the element isolation dielectric film 11 isformed and buried as shown in FIG. 5, thus obtaining the state thatisland-like n-type silicon layers 12 are laid out in a matrix form.Practically, for example, form in an element isolation area an elementisolation trench which reaches the p-type silicon substrate 10; then,form the element isolation dielectric film 11 by a method of burying asilicon oxide film in this element isolation trench.

Thereafter, as shown in FIG. 6, deposit a metal film such as aluminum orelse; then, perform patterning to thereby form the word lines 21. Theword lines 21 are formed into a pattern so that each is offset inposition to one side of its associative n-type silicon layer 12,resulting in the Schottky diode SD being formed between it and the wordline 12.

Next, as shown in FIG. 7, form a flat or planar interlayer dielectricfilm 22 to cover the word lines 21; then, form in this interlayerdielectric film 22 contact holes 31 for exposing the cathode-sideterminate end portion of each n-type silicon layer 12. And, as shown inFIG. 8, after having formed n⁺-type layers 26 by performing ionimplantation through the contact holes 31, bury metal plugs 23 for useas cathode electrodes in the contact holes 31.

Next, as shown in FIG. 9, form the chalcogenide layer 24 on theinterlayer dielectric film 22 in which the metal plugs 23 are buried;further, form thereon bit lines 25 by a metal film. As previouslystated, the portions in the chalcogenide layer 24 whereat the bit lines25 oppose the metal plugs 23 become the resistive elements VR for use asthe real cell regions.

In the case of this embodiment, it is possible to form the word lines 21and the metal plugs 23 with a pitch of 3 F, where F is the minimumdevice-feature size, in the longitudinal direction of the bit lines 25while forming the bit lines 25 and metal plugs 23 with a pitch of 2 F inthe longitudinal direction of the word lines 21. Thus, a unit cell areabecomes equal to 6 F².

Although in the above example the chalcogenide layer 24 is formed on anentire upper surface of the interlayer dielectric film 22, patterningmay be done while letting this be left in the cell regions only. Across-sectional structure of a cell array in such case is shown in FIG.10 in a way corresponding to FIG. 3A. The chalcogenide layer 24 shownherein is removed while leaving the portions which become the variableresistive elements VR that are phase-change layers required for thecells, with an interlayer dielectric film 32 buried around the peripheryof such portions. With such an arrangement, the resulting resistiveelements VR become in the state with the lack of any spreadingresistance whereby a resistance ratio of the crystalline state and theamorphous state and a thermal conductivity ratio become greater.

An exemplary cell array cross-section structure using pn-junction diodesin place of the Schottky diodes is shown in FIG. 11 in a waycorresponding to FIG. 3A. Form a p-type layer 33 in the n-type siliconlayer 12 of the region in which a word line 21 is formed; then, let theword line 21 be come into contact with this p-type layer 33. Whereby,the cell array using the pn-junction diodes is obtained.

The examples stated up to here are such that the n-type silicon layer 12of each element region is isolated by a pn junction from the others. Incontrast to this approach, it is also possible to set each n-typesilicon layer 12 in an insulatively separated “floating” state.

FIG. 12 shows a cell array cross-section structure of such example in away corresponding to FIG. 3A. The n-type silicon layer 12 is buried witha silicon oxide film 34 at its bottom portion and thus is isolated fromthe p-type silicon substrate 10. Practically, this type of structure isobtained by use of the so-called SOI wafer having a silicon layer whichoverlies a silicon substrate and which is isolated therefrom by asilicon oxide film. With the use of this structure, excellentcharacteristics are obtainable which are free from any leakage betweenrespective cells.

The diode SD may alternatively be reversed in polarity as has beendescribed previously: FIG. 13 shows a cell array cross-section structureof such an example in a way corresponding to FIG. 3A. In this example, adiode SD that makes up the Schottky junction between a metal plug 23 andan n-type silicon layer 12 is formed. A word line 21 and the n-typesilicon layer 12 are such that an n⁺-type layer 26 is formed at thisportion to let them be in ohmic contact. The same goes with the case ofa pn-junction diode.

Note here that although in the embodiments to be discussed later anexplanation will be given exclusively relative to the case of employingSchottky diodes with the word-line side as the anode, variousmodifications such as those which have been explained in FIGS. 10 to 13are possible in the later-described embodiments also.

FIG. 14 depicts a plan view of another cell array configuration whichrealizes the cell array of FIG. 1; FIGS. 15A and 15B are itscross-sectional views as taken along lines I-I′ and II-II′,respectively. In this embodiment, an electrically insulative ordielectric substrate is used to arrange thereon the intended cell array.

In the example of this figure of drawing, a silicon substrate 40 havingits surface covered with a silicon oxide film 41 is used as thedielectric substrate. Above this substrate, word lines (WL) 42 formed ofa metal film are formed, wherein portions interposed between the wordlines 42 are made flat or planarized after an interlayer dielectric film43 is buried therein.

On the word lines 42, n-type polycrystalline silicon layers 44 which areisolated in units of respective cell regions are formed so that diodesSD are made each of which forms a Schottky junction between a word line42 and layer 44. An n⁺-type layer 45 is formed at a surface of eachn-type silicon layer 44, and an ohmic electrode (cathode electrode) 46is formed and connected thereto.

An interlayer dielectric film 47 is buried and planarized around theperiphery of Schottky diodes. A chalcogenide layer 48 is formed tooverlie it; further, on this layer, bit lines (BL) 49 of a patternedmetal film are formed.

In the case of this embodiment also, the regions in the chalcogenidelayer 48 with the bit line 49 opposing the ohmic electrodes 46 becomevariable resistive elements VR which are the real cell regions (phasechange areas), thus constituting the cell array of FIG. 1.

FIGS. 16-19 show some major steps of a manufacturing process whilegiving attention to the cross-section of FIG. 15A. As shown in FIG. 16,form word lines 42 on the substrate through deposition and patterning ofa metal film. Thereafter, bury an interlayer dielectric film 43 at everyportion between adjacent ones of the word lines 42. This process may bereversed in order. More specifically, a damascene method may be used,which includes the steps of first depositing the interlayer dielectricfilm 43, forming therein wiring line grooves, and burying the word lines42 in these wiring grooves.

Next, as shown in FIG. 17, form an n-type polycrystalline silicon layer44, and, after having formed an n⁺-type layer 25 in its surface portion,further form an ohmic electrode film 46. Whereby, diodes SD, each ofwhich has a Schottky junction between the n-type layer 44 and word line42, are formed.

Subsequently as shown in FIG. 18, etch by lithography and RIE the partthat covers from the electrode film 46 up to the n-type silicon layer 44in such a way that it is left with an island like pattern in each cellarea. Whereby, the resultant structure becomes in such a state thatSchottky diodes SD are disposed at intervals on the word lines 42.

Thereafter, as shown in FIG. 19, an element isolation dielectric film 47is planarly buried around the Schottky diodes SD. Subsequently, as shownin FIGS. 15A-B, deposit a chalcogenide layer 48; further, form bit lines49 thereon.

According to this embodiment, since the diodes are formed above the wordlines, it is possible to lessen a unit cell area of the cell array whencompared to the previous embodiments. More specifically, the unit cellarea becomes 4 F2 as a result of formation of the word lines WL with theline/space=1 F/1 F and also formation of the bit lines with the sameline/space=1 F/1 F.

Additionally in the case of this embodiment, the cell array is formed onor above the dielectric substrate by film deposition and patterning;thus, it is also possible to reverse the up/down or verticalrelationship of the diodes SD and the resistive elements VR. Further, itis also readily achievable to stack cell arrays into the form of amultilayered structure by repeated execution of the film deposition andpatterning.

A detailed explanation will be given of an embodiment for achievement ofthe multilayered cell arrays below. FIGS. 20-22 illustrate, in anequivalent circuit that takes aim at one bit lone BL, examples whichhave two cell arrays MA0, MA1 stacked with shared bit lines BL, withrespect to three forms which are made different in layout relationshipof respective elements.

In FIG. 20, a memory cell MC configuration which connects the anodes ofdiodes SD to word lines WL with variable resistive elements VR disposedon the bit-line BL side is arranged to include upper and lower cellarrays MA0, MA1 while letting them share the bit line BL shown herein.In this figure, arrows are used to indicate the directions of cellcurrents when cells of the upper and lower cell arrays are selected.

In FIG. 21, an example shown herein is different from that of FIG. 20 inthe upper cell array MA1. More specifically, the lower cell array MA0employs a memory cell MC configuration which connects the anodes ofdiodes SD to word lines WL with variable resistive elements VR disposedon the bitline BL side. In contrast, the upper cell array MA1 uses amemory cell MC arrangement which connects the cathodes of diodes SD tothe bit line BL with variable resistive elements VR laid out on theword-line WL side. This example is similar to that of FIG. 20 in thatthe upper and lower cell arrays MA0, MA1 share the bit line BL.

An example of FIG. 22 is such that the layout of diodes SD and resistiveelements VR is inverse to that of FIG. 20. Specifically, a memory cellMC configuration is used which connects the cathodes of diodes SD to thebit line BL while letting resistive elements VR be disposed on theword-line WL side, thus configuring the upper and lower cell arrays MA0,MA1 with the bit line BL shared thereby. Both the examples of FIG. 21and FIG. 22 are the same in cell current flow directions.

In either one of the examples of FIGS. 20-22, let bit lines BL be set at“H” level (for example, 1.8V) while setting word lines WL at “L” level(e.g. 0V) in a nonselect state. And, with respect to one of the upperand lower cell arrays MA0, MA1, if setting a selected word line at “H”level and a selected bit line BL at “L” level, then the diodes do notbecome forward-biased in the other cell array; thus, it becomes alsopossible to provide access to the upper and lower cell arrays MA0, MA1in a way independent of each other.

FIGS. 23-25 show the stacked structures of the cell arrays MA0, MA1 ofFIGS. 20-22, respectively. In these figures, the same reference numeralsare used at parts or components corresponding to those of FIG. 15A,which numerals are distinguished between the lower and upper cell arraysby addition of suffixes “a”, “b” thereto.

In FIG. 23, the structure of a lower cell array MA0 is the same as thatof FIG. 15A. An upper cell array MA1 is stacked over this lower cellarray MA0 in such a way as to share bit lines 49 at its uppermost part.The upper cell array MA1 is opposite in film stack/lamination order tothe lower cell array MA0, and a chalcogenide layer 48 b is formed on thebit lines 49. Sequentially stacked thereon are an ohmic electrode film46 b, an n-type silicon layer 44 b with an n⁺-type layer 45 b formed atits bottom, and word lines 42 b.

In FIG. 24 also, a lower cell array MA0 is the same as that of FIG. 15A.The film stack order of an upper cell array MA1 to be stacked ormultilayered above it is different from that of FIG. 23. Morespecifically, an n-type silicon layer 44 b with an n+-type layer 45 bformed at its bottom and a metal film 46 b are formed and stacked abovea bit line 49, thus making up a diode SD. Unlike the ohmic electrode 46b of FIG. 23, the metal film 46 b of FIG. 24 forms a Schottky junctionbetween it and the n-type silicon layer 44 b. And, on the diode SD thusformed, a chalcogenide layer 48 b is formed; further, word lines 42 bare formed thereon.

In FIG. 25, a lower cell array MA0 shown is opposite to that of FIG. 15Ain layer-stack order of diodes SD and resistive elements VR. Firstformed on a plane in which word lines 42 a are buried is a chalcogenidelayer 48 a which constitutes the resistive elements VR. Formed thereonare a metal film 46 a and an n-type silicon layer 44 a to thereby form aSchottky junction between it and the metal film 46 a. An n⁺-type layer45 a is formed at an upper surface of the n-type silicon layer 44 a, anda bit line 49 is formed to be in contact with this layer. Formed abovethe bit line 49 is an upper cell array MA1 which is similar inlayer-stacked structure to that of FIG. 23.

Although the ones shown by the equivalent circuits of FIGS. 20 to 22 andtheir corresponding cross-sectional structures of FIGS. 23-25 arearranged so that the cell arrays are stacked with shared bit lines, itis also possible to simply stack the upper and lower cell arrays withoutsharing any bit lines.

FIG. 26 shows an example of such stacked cell arrays. This is the onethat the cell array structure shown in FIG. 15A is repeatedly stackedwith an interlayer dielectric film 51 sandwiched between adjacent cellarrays. The lower cell array MA0 and the upper cell array MA1 are in thestate that these are electrically separated from each other. In thisway, if the electrically completely isolated cell arrays are stacked,then it is possible to freely select the diode polarity and voltagepotential relationship between the upper and lower cell arrays.

Further, it is also possible to design the upper and lower cell arraysso that these are stacked with shared word lines. FIG. 27 shows anequivalent circuit of such an example in which word lines WL of thelower cell array MA0 and upper cell array MA1 are commonly used orshared. As the vertically neighboring cell arrays which are stackedwhile sharing the word lines or bit lines are such that the bit lines orword lines are independent, it is possible to access themsimultaneously.

Owing to this, the cell array assembly which shares the word lines orthe bit lines expands in applicability and becomes effective for use inmultiple-value memories or the like. This point will be described later.In the figure, every cell current of the upper and lower cell arraysupon selection of a shared word line WL is indicated by arrow.

FIG. 28 is a sectional diagram showing a stacked structure of the cellarrays MA0, MA1. In this figure also, at portions which correspond tothose of FIG. 15A, the same numerals are used which are distinguished byaddition of “a”, “b” between the lower and upper cell arrays. First, ona silicon substrate 40 covered with a silicon oxide film 41, a pluralityof bit lines (BL0) 49 a are formed and disposed. Gap spaces between thebit lines 49 a are buried with an interlayer dielectric film. Formedthereon is a chalcogenide layer 48 a.

Diodes SD are formed above the chalcogenide layer 48 a in such a mannerthat these are placed at intervals to overlie respective bit lines 49 a.More specifically, through patterning of a film which consists of alamination of an ohmic electrode 46 a, n ⁺-type silicon layer 45 a andn-type silicon layer 44 a, the main body of a Schottky diode SD is madeup of n-type silicon film 44 a. The periphery of the diode main body isburied with an interlayer dielectric film and thus planarized.

And, word lines (WL) 42 are formed which become the anode electrodes ofdiodes SD and commonly connect the diodes SD together in a directioncrossing the bit lines. In brief, Schottky junction is formed between aword line 42 and its associative n-type silicon layer 44 a. Note herethat in order to form a more preferable Schottky diode SD, a metal filmwhich is in Schottky contact with the n-type silicon layer 44 a may beseparately formed in addition to the word line 42.

Spaces between the word lines 42 are buried with an interlayerdielectric film and then made flat. And, on this film, a Schottky diodeSD is formed by patterning of a film with a lamination of an n-typesilicon layer 44 b, n ⁺-type silicon layer 45 b and ohmic electrode 46b. A Schottky junction is formed between a word line 42 and itsassociated n-type silicon layer 44 b.

The periphery of diode SD is buried with an interlayer dielectric filmand planarized; further, a chalcogenide layer 48 b is formed thereon.Bit lines (BL1) 49 b are formed by patterning on the chalcogenide layer48 b.

With the above-noted procedure, it is possible to stack the cell arraysMA0, MA1 over each other while letting them share the word lines WL.Although in FIGS. 27 and 28 one specific example is shown in which thelayer-stack order of the diodes SD and resistive elements VR arereversed between the lower and upper cell arrays MA0, MA1, these mayalternatively be the same in stack order as each other. Additionally,the stack order of the resistive elements VR and diodes SD may also bereversed within each cell array MA0, MA1.

More specifically, in such an access scheme that a selected word line WLis set at “H” level, and a selected bit line BL at “L” level, the stackorder of diodes SD and resistive elements VR may be freely designed, asfar as the diodes SD are disposed to have the polarity with theword-line WL side becoming the anode in both the upper and the lowercell arrays.

When combining together the previously explained scheme for stacking thecell arrays with the shared bit lines and the scheme for stacking thecell arrays with the shared word lines, it is possible to mount and pileup the cell arrays into the form of a multilayer of more than threelayers while sharing the word lines and bit lines between the verticallyneighboring cell arrays, which in turn makes it possible to obtain anextra large capacity of memory with a three-dimensional (3D) structure.

Note that any one of the stacked cell array structures shown in FIGS.23-26 and 28 is capable of forming both the bit lines and the word lineswith the line/space of 1 F/1 F. Thus it is possible to achieve higherintegration densities of the cell arrays. The same goes with the case ofstacking cell arrays of more than three layers as will be describedlater.

FIG. 29 shows an exemplary configuration of a selection circuit 50 whichis for transferring positive logic pulses and negative logic pulsestoward the word lines WL and the bit lines BL of a cell arrayrespectively during data reading or writing. The selection circuit 50has a PMOS transistor QP1 which is driven by a select signal /WS duringreading for connecting a word line WL to a high voltage power supplyline WPS, and an NMOS transistor QN0 that is driven by a select signalBS for connecting a bit line BL to a low voltage power supply line BPS.The selector circuit 50 also has a reset-use NMOS transistor QN1 and areset-use PMOS transistor QP0 which are for holding word lines WL at alow level and bit lines BL at a high level when they are not selected.

The select signals /WS, BS are such outputs of address decoders as tobe/WS=“H”, BS=“L” in the nonselect state. Accordingly, in the nonselectstate, the select transistors QP1, QN0 are in an off-state and the resettransistors QN1, QP0 are in an on-state so that the word lines WL areheld at “L” level of Vss and the bit lines BL are at “H” level of Vcc.When becoming in a select state, the reset transistors QN1, QP0 turn offand the select transistors QP1, QN0 turn on.

During data reading, the word line WL and bit line BL are connected tothe high voltage power supply line WPS and low voltage power supply lineBPS, respectively, as shown in the figure of drawing. Suppose that thehigh voltage power supply line WPS and low voltage power supply line BPSare given “H” level (e.g. Vcc=1.8V) and “L” level (e.g. Vss=0V),respectively. Whereby, a read current flows in the memory cell MC inaccordance with the on-state periods of the select transistors QP1, QN0.

FIG. 30 shows a basic configuration of a sense amplifier (SA) circuit100 adaptable for use with the cell array in accordance with thisinvention. This shows it as an exemplary configuration preferable fordevelopment to a sense amplifier scheme in the case of realizingmultiple-value storage as will be described later.

The sense amp circuit 100 shown in FIG. 30 is a current detection typesense amp, which is configured to include resistors R0, R1 which are theelements for converting a current flowing in a selected cell into avoltage, a dummy cell DMC, resistors r0, r1 for converting a currentflowing in this dummy cell DMC to a voltage, and operational amplifiersOP0, OP1.

When a certain word line WL in the cell array is selected by the selectPMOS transistor QP1 which is driven by the select signal /WS that is anoutput of a row address decoder, the selected word line WL is connectedto the high voltage power supply line WPS through a signal line WP andthe resistor R1. A bit line BL is selected by the select NMOS transistorQN0 being driven by a select signal BS that is an output of a columnaddress decoder, and is then connected to the low voltage power supplyline BPS through a signal line BP and the resistor R0.

The dummy cell DMC which is equivalent to a memory cell MC is made up ofa dummy diode DSD and a dummy resistive element DVR and is expected tohave an intermediate resistance value midway between the resistancevalues of binary data of the memory cell MC. One end of the dummy cellDMC is connected to the high voltage power supply line WPS through thePMOS transistor QP2 and via the resistor r1.

The PMOS transistor QP2 is a dummy element of the select PMOS transistorQP1 and is driven to a normally-on state in any events. The other end ofthe dummy cell DMC is connected to the low voltage power supply line BPSthrough the NMOS transistor QN2 and via the resistor r0. The NMOStransistor QN2 is a dummy element of the select NMOS transistor QN0 andis driven to a normally-on state in any events.

The sense-amp main body is composed of two operational amplifiers OP0,OP1. The opamp OP0 has a non-inverting input terminal to which a voltageof an output “b” of an appropriate intermediate tap of the resistor R0is input and also has an inverting input terminal to which a voltage ofa connection node of the resistor r0 and NMOS transistor QN2 is input.The opamp OP1 has an inverting input terminal to which a voltage of anoutput “w” of an intermediate tap of the resistor R1 is input and anon-inverting input terminal to which a voltage of a connection node ofthe resistor r1 and PMOS transistor QP2 is input.

An operation of the sense amplifier circuit 100 thus arranged will beexplained below. As previously stated, in the nonselect state, the wordlines WL are held at “L” level, and the bit lines BL stay at “H” level.At the time of selection, the word line select signal /WS becomes at“L”, and the bitline select signal BS becomes “H”. And, assuming thatthe high voltage power supply line WPS is given “H” level=Vcc and thelow voltage power supply line BPS is given “L” level=Vss, a cell currentflows in a selected memory cell MC.

Practically, suppose that the relationship of the resistors R0, R1, r0,r1 is established so that a resistance value of the resistor R0 of fromthe intermediate tap of the voltage output b toward the opamp OP0 up tothe terminal BPS is the same as the resistor r0 and, similarly, aresistance value of the resistor R1 of from the intermediate tap of thevoltage output “w” toward the opamp OP1 up to the terminal WPS is thesame as the resistor r1, by way of example.

If the selected cell is in a high resistance state (hereinafter, letthis be regarded as data “0”) and if the cell current is less than thecurrent flowing on the dummy cell DMC side, then both outputs of theopamps OP0, OP1 become “L”. To the contrary, if the selected cell is ina low resistance state (let this be data “1” hereinafter) and when acurrent flows which is greater than the current flowing on the dummycell DMC side, the both outputs of the opamps OP0, OP1 become “H”. To bebrief, based on the logic shown in FIG. 32, it is possible to performdetermination or judgment of data “0”, “1”.

It should be noted that the configuration of the sense amp circuit 100of FIG. 30 is the one that takes into consideration the multi-valuestorage to be later described: in the case of considering theabove-stated two-value or binary storage only, only either one of theopamps OP0, OP1 may be used. Alternatively, it is also possible toreverse the connection relationship of the inverting input terminal andnon-inverting input terminal of any one of the opamps OP0, OP1.

The result of this is that the outputs of two opamps OP0, OP1 are suchthat one becomes “H” and the other becomes “L” in accordance with thebinary data. Accordingly, if an opamp which inputs these two opampoutputs is further prepared, it is possible to obtain a sense outputwith the data “0”, “1” corresponding to “H”, “L”.

An explanation will next be given of the case where multi-value storageis performed by the stacked two-layer cell arrays MA0, MA1 with theshared word lines WL as has been explained in FIGS. 27 and 28. Themultivalue storage utilizes a combination of four possible data statesof two memory cells which are accessed simultaneously between two cellarrays MA0, MA1. A sense amplifier circuit 100 for use with four-valuestorage, which is a developed or extended version of the circuit schemeof FIG. 30, is shown in FIG. 31.

The sense amplifier circuit 100 of FIG. 31 is the same as that of FIG.30 in arrangement of the part including the current-to-voltageconversion resistors R0, R1, r0, r1 and opamps OP0, OP1 with respect toa memory cell MC0 and a dummy cell DMC0 that are selected by a bit lineBL0 of the lower cell array and the shared word line WL. Regarding amemory cell MC1 to be selected by the shared word line WL and a bit lineBL of the upper cell array also, a similar arrangement is used whileletting the wordline WL side circuitry be shared by the lower cellarray.

A bit line BL1 on the upper cell array side is connected to the lowvoltage power supply line BPS through a select NMOS transistor QN3 andalso via a signal line BP1 and a resistor R2. In addition, a dummy cellDMC1 is connected via resistors r2, r1 between the low voltage powersupply line BPS and the high voltage power supply line WPS, and anoperational amplifier OP2 is prepared. The operational amplifier OP2 hasan inverting input terminal to which a connection node of the resistorr2 and a dummy NMOS transistor QN4 is connected and a non-invertinginput terminal to which a voltage output “b1” of an intermediate tap ofthe resistor R2 is input.

With such the configuration of sense amp circuit 100, it is possible todetermine or judge four-value data by combination of the data states“0”, “1” of the memory cell MC1 of the upper cell array and the datastates “0”, “1” of the memory cell MC0 of the lower cell array, whichcells are selected simultaneously.

In FIG. 31, there is shown the behavior of cell currents Ic0, Ic1 whichflow in the memory cells MC0, MC1 when the shared word line WL isselected while the bit lines BL0 and BL1 are selected. An upside columnof the truth value table shown in FIG. 33 indicates a combination of thedata states “0”, “1” of the memory cell MC1 and the data states “0”, “1”of the memory cell MC0.

For data “00” (namely, the memory cells MC1, MC0 are both at “0” (highresistance state)), an output OUT1 of the operational amplifier OP1 isat “L”. While outputs OUT0, OUT2 of operational amplifiers OP0, OP2 areboth at “L”, these are not required for use during data determinationand, for this reason, indicated by “-”. This will be applied similarlyin the explanation below.

At the time of data “01” (i.e. the upper cell MC1 stays at “0” and thelower cell MC0 is at “1” (low resistance state)), a large current flowson the lower cell MC0 side so that the outputs OUT0, OUT1 of opamps OP0,OP1 become “H” while the output OUT2 of opamp OP2 stays at “L”.

At the time of data “10” (i.e. the upper cell MC1 is “1” and the lowercell MC0 is “0”), a significant current flows on the upper cell MC1 sidewhereby the outputs OUT1, OUT2 of opamps OP1, OP2 become “H” and theoutput OUT0 of opamp OP0 is at “L”. Thus, the data “01” and “10” aredeterminable by “L”, “H” of OUT2, OUT1 and “H”, “L” of OUT1, OUT0.

In the case of data “11” (the upper and lower cells MC1, MC0 are both“1”), large currents flow in the both, causing all the outputs OUT0-OUT2of the opamps OP0-OP2 to become “H”. As apparent from the foregoing,4-value storage is achievable by using two cells of the upper and lowercell arrays based on the truth value table shown in FIG. 33 due to thecombination of the outputs OUT0-OUT2 of three opamps.

An explanation will next be given of an example which makes up aneight-value memory by use of three-layer stacked cell arrays.

FIG. 34 depicts an equivalent circuit of the three-layer cell arrays,wherein a cell array MA0 is made up of memory cells which are interposedbetween bit lines BL0 (BL00, BL01, . . . ) of the lowermost layer andword lines WL0 (WL00, WL01, . . . ). A cell array MA1 is arranged at itsupper part while sharing such word lines WL0; further, a cell array MA2is stacked or piled while sharing bit lines BL1 (BL10, BL11, . . . ) ofthis cell array MA1.

In FIG. 34, the directions of cell currents upon selection of cells fromthe three-layered cell arrays MA0-MA2 on the one-by-one basis areindicated. Using such the 3-layer cell arrays, 8-value storage becomespossible by combination of the data states of three memory cells thatare simultaneously selected from the cell arrays.

FIG. 35 shows a sense amplifier circuit 100 employable in the case ofperforming such 8-value storage, which is an extended version of thesense amp scheme of FIG. 31. In this case, there are provided anoperational amplifier OP0 which is used for current detection of a bitline BL0 of the first cell array MA0, an opamp OP1 used for currentdetection of a shared word line WL0, an opamp OP2 used for currentdetection of a shared bit line BL1, and an opamp OP3 used for currentdetection of the uppermost word line WL1.

In FIG. 35, there is also shown the behavior of cell currents Ic0, Ic1and Ic2 which flow in cells MC0, MC1 and MC2, respectively, that aresimultaneously selected in the 3-layer cell arrays.

FIG. 36 shows a truth value table upon detection of multi-value cellstates in the case of using such a sense amplifier circuitconfiguration. An upside row of FIG. 36 is a combination of the datastates of the cell MC2 of the upper cell array MA2, the cell MC1 of theintermediate cell array MA1, and the cell MC0 of the lower cell arrayMA0.

It is apparent from viewing FIG. 36 that in the case of data states“101” and “111”, outputs of all the opamps become “H”, resulting inoccurrence of degeneration or “degeneracy” and thus in the lack ofdistinguishability. The reason of this is as follows: at this time, alarge cell current flows from the word line WL1 through the cell MC2into the bit line BL1, and similarly, a large current flows from theword line WL0 via the cell MC0 to the bit line BL0, thereby causing theoutputs of all opamps OP0-OP3 to become “H” without regard to the datastate of intermediate cell MC1.

Therefore, in order to effectively utilize all the 8-value data, asense-amp circuit scheme capable of distinguishing between the data“101”, “111” is required. One approach to achieving this is to utilizethe fact that when the upper cell MC2 and the lower cell MC0 are both“1”, a difference between the case of the intermediate cell MC1 of “0”and the case of “1” lies in that the values of currents flowing in theword line WL0 in these cases are different from each other. Morespecifically, if the cell MC0 is “1” and the cell MC1 is “0”, a largecurrent flows from the word line WL0 into only the cell MC0.

Contrary to this, if the cells MC0, MC1 are both at “1”, a large currentflows from the word line WL0 into both of the cells MC0, MC1; thus,looking at the current of the word line WL0, a difference with a doubledcurrent value takes place.

Keeping this point in mind, a sense amp circuit 100 which is an improvedversion of the circuit of FIG. 35 is shown in FIG. 37. This is the onethat includes, at the part of the operational amplifier OP1 whichperforms current detection of the word line WL0 shown in FIG. 35, aparallel combination of operational amplifiers OP10, OP11 which becometwo current detection units in order to make it possible to accuratelyfind any appreciable difference in current value between the case ofboth the memory cells MC0, MC1 storing data “1” therein and the case ofonly one of them storing data “1”.

Let outputs w01, w02 of two intermediate taps be taken out to theresistor R1 on the high voltage power supply line WPS side with respectto word line WL0, which are then passed to the inverting input terminalsof the opamps OP10, OP11, respectively. Here, w02 is a tap positionoutput which is less than w01 in resistive voltage drop, which isdesigned so that when the current value becomes almost two timesgreater, a voltage potential is output which is approximately the sameas the value of w01 at a onefold current value.

In other words, the tap positions of the intermediate tap outputs w01,w02 of the resistor R1 should be adjusted as follows: comparing to acurrent flowing in the dummy cell, when the current which flows from thehigh voltage power supply line WPS toward a single low-resistance cell(“1” data cell), output OUT10 is at “H” and OUT11 becomes “L”, whilecausing the both of OUT10, OUT11 to become “H” when the current flowstoward two low-resistance cells.

With the use of such sense amp circuit, it is possible to detect anddetermine 8-value data while accurately distinguishing each over theothers without having to use the opamp OP2 which corresponds to the bitline BL1. A truth value table thereof is shown in FIG. 38. The 8-valuedata states (state values of MC2, MC1, MC0) owing to three cells isshown in the uppermost row.

By appropriate combination of “H”, “L” of the output OUT0 of opamp OP0relative to the bit line BL0, “H”, “L” of the outputs OUT10, OUT11 oftwo opamps OP10, OP11 corresponding to the word lines WL0 and “H”, “L”of the output OUT3 of opamp OP3 corresponding to the word line WL1, itis possible to distinguishably determine eight values in such a statethat any degeneracy is absent.

It should be noted that the sense amp circuit scheme for performing thecurrent value determination at word lines shown in FIG. 37 is alsoapplicable to the 4-value storage stated previously. More specifically,in place of the three opamps OP0, OP1, OP2 of FIG. 31, use three opampsOP0, OP10, OP11 shown in FIG. 37. At this time, a 4-value truth tablecorresponding to FIG. 33 is as shown in FIG. 39.

Next, an explanation will be given of a 16-value storable memoryconfiguration by use of four-layer stacked cell arrays. FIG. 40 is anequivalent circuit of it. Although the structure of such stacked cellarrays is not specifically shown, the illustration here assumes the useof stacked cell arrays obtainable by repeated use of the stackedstructure of wordline-shared two-layer cell arrays MA0, MA1 shown inFIG. 28.

Accordingly, a first cell array MA0 and its overlying second cell arrayMA1 are designed to share word lines WL0 (WL00, WL01, . . . ). Thesecond cell array MA1 and its overlying third cell array MA2 share bitlines BL1 (BL10, BL11, . . . ). Further, the third cell array MA2 andits overlying fourth cell array MA3 share word lines WL1 (WL10, WL11, .. . ). In the figure, arrows are used to indicate the directions of cellcurrents flowing when both the upper and lower shared word lines WL0,WL1 are selected at a time.

Based on the 4-bit data to be selected respectively from the 4-layercell arrays thus arranged, 16-value storage is performed. Suppose thatthe sense amp circuit scheme shown for example in FIG. 31 or FIG. 35 issimply applied with no changes as a sense amp circuit therefor.

Although its illustration is omitted, operational amplifiers to beprovided at this time are five ones which follow: OP0 with respect tothe bit lines BL0 of the lowermost layer; OP1 for the next first sharedword lines WL0; OP2 for the next shaped bit lines BL1; OP3 for the nextsecond shared word lines WL1; and, OP4 for the bit lines BL2 of theuppermost layer.

A truth value table of 16 values with the outputs of five operationalamplifiers OP0-OP4 as OUT0-OUT4 in the case of the sense amp circuitscheme is as shown in FIG. 41. An upside row is 16-value cell states (acombination of the state values of a selected cell of cell array MA3, aselected cell of cell array MA2, a selected cell of cell array MA1, anda selected cell of cell array MA0).

According to this truth value table, three sets of multivalue-statedegeneration or degeneracy are found. More specifically, data “0101” and“0111” are such that the output OUT4 is at “L” with all the remainingoutputs staying at “H”, resulting in a failure to distinguish one fromthe other. Data “1010” and “1110” are such that the output OUT0 is “L”with all the remaining outputs staying at “H”, resulting in the lack ofdistinguishability therebetween. Additionally, data “1011”, “1101”,“1111” are such that every output becomes “H”.

An approach to effectively putting all of the 16-value multivalue datato practical use is to employ the sense amp circuit scheme of FIG.37—that is, the scheme that is capable of distinguishing, with respectto the current flowing in a word line, between a case of the currentflowing in a single cell and another case of the current flowing in twocells. Practically, when showing an extended version of the sense ampcircuit scheme of FIG. 37 in a way corresponding to the 16-value storageof the 4-layer cell arrays, the result is as shown in FIG. 42.

In a similar way to that two operational amplifiers OP10, OP11 areprovided relative to the first shared word lines WL0 counted from thelowermost part, two operational amplifiers OP30, OP31 are also providedwith respect to the second shared word lines WL1. These opamps OP30,OP31 operate to input two intermediate tap outputs w10, w11 of aresistor R3 at their inverting input terminals, thereby making itpossible to distinguish between the case of a one-cell current flowingin word line WL1 and the case of two-cell currents flowing therein.

A truth value table in the case of performing 16-value storage usingsuch the sense amp circuit is shown in FIG. 43. Here, 16 values arerepresentable by combination of six outputs which consist of an outputOUT4 of op-amp OP4, outputs OUT30, OUT31, OUT10, OUT11 of opamps OP30,OP31, OP10, OP11 two of which are provided relative to the individualone of two shared word lines WL1, WL0, and an output OUT0 of opamp OP0relative to a bit line BL0 of the lowermost layer. An output of opampOP2 is of no use, which opamp is provided in a way corresponding to theshared bit line BL1 of the second cell array MA1 and third cell arrayMA2.

As apparent from the truth value table of FIG. 43, it is possible toattain successful detection and determination of all the 16-value dataitems without suffering from any degeneracy. In accordance with thistruth table, make logic circuitry with assignment to 16-value outputs,thereby enabling judgment and output of 16-value information owing tofour cells of the 4-layer cell arrays.

In the description above, the sense amp circuit configurations formultivalue data determination in the state without the risk ofdegeneracy have been explained.

Up to here, the description is devoted to the ones that put in parallelthe operational amplifiers for detection of currents flowing in the wordlines WL in order to determine whether the cell current flowing in anintermediate cell vertically interposed between upper and lower cells isone-cell component or two-cell components.

In contrast to this approach, the aforethe current determination foridentifying whether a one-cell component or two-cell components mayalternatively be done on the bitline BL side. An example is that aconfiguration of FIG. 44 is used as the sense amp circuit 100 relativeto a unit cell array, in place of that of FIG. 31.

Let two operational amplifiers OP00, OP01 be provided in parallel on thebitline side; then, input to the inverting input terminals of them twointermediate tap outputs b01, b02 of a resistor R0. The intermediate tapoutputs b01, b02 are set up in a way which follows: outputs of theopamps OP00, OP01 are OUT00=L and OUT01=L in case any bitline currentdoes not flow; OUT00=H, OUT01=L when a single-cell bitline currentflows; and, OUT00=OUT01=H upon flowing of a bitline current equivalentin amount to two cells.

With the use of the sense amplifier circuit 100 thus arranged, itbecomes possible to sense and verify multivalue storage data by means ofthe stacked or multilayered cell arrays which include neighboring cellarrays that share bit lines. Although its detailed explanation isomitted, if in the case of 8-value storage by use of 3-layer cell arraysas an example, data discrimination without the risk of any degeneracy ismade possible by replacing the part of the op-amp OP2 on the bitline BL1side in the sense amp (SA) circuit 100 of FIG. 37 with a parallelcombination of two opamps OP00, OP01 which are shown in FIG. 44 and arecapable of data determination while distinguishing between a one-cellbitline current and a two-cell bitline current.

It is also permissible to modify it to offer the distinguishabilitybetween the one-cell current and two-cell current in a similar way inboth the bit line BL and the word line WL. A configuration of such asense amplifier circuit 100 is shown in FIG. 45, with respect to a unitcell array thereof. Using this as a basic or “core” sense amp circuit,the multivalue cells of stacked cell arrays may be designed to providean arrangement capable of determining multivalue information by adequatecombination of outputs in such a way that their truth value tablebecomes the simplest one.

An explanation will next be given of a data write circuit which writesor “programs” data into multivalue cells. An approach to permittingcreation of a phase change between amorphous and polycrystalline statesin a chalcogenide-based phase change layer (variable resistive element)is to control the amount of power being given to the cell by adjustmentof a voltage pulse width.

When a power is rapidly given to the chalcogenide with a short pulsewidth, and then it is left rapidly cooled off, the chalcogenide partlybecomes amorphous state, and its resistance increases so that the cellbecomes in the data “0” state. If a power is given to the chalcogenidewith a long voltage pulse width for a long time period, and then it isleft gradually cooled off, the chalcogenide becomes in itspolycrystalline state, which results in a decrease in resistance andthus establishment of the data “1” state.

Practically, FIG. 46 shows an arrangement in which a write circuit 200is provided in parallel to its associative sense amplifier circuit 100,with respect to the case of 4-value storage at the upper and lower cellarrays MA0, MA1 which have been explained in conjunction with FIG. 27and FIG. 31. During data writing, the sense amp circuit 100 is madeinactive, and the write circuit 200 is activated.

The write circuit 200 is the one that produces, in a way pursuant tomultivalue data to be written, a positive logic write pulse H to begiven to a word line WL through a signal line WP and negative logicwrite pulses L0, L1 being given to bit lines BL0, BL1 via signal linesBP0, BP1, respectively.

A way of giving the write pulses to 4-value cells produced by this writecircuit 200 is as follows: give the positive logic write pulse and thenegative logic write pulses simultaneously to thereby ensure that thediode SD becomes forward-biased within a limited time period in whichthe pulses overlap together, resulting in power being applied to thevariable resistive element VR of the chalcogenide.

A practically implemented one is as shown in FIG. 47. In summary, letthe negative logic write pulses L0, L1 which are given to a presentlyselected lower bit BL0 and selected upper bit line BL1 and the positivelogic write pulse H that is given to a shared word line WL be set in apulse width relationship such as shown in FIG. 47, in a waycorresponding to the states of multivalue data to be written.

A multivalue data state “00” is indicated by a combination of a writevalue “0” of an upper cell (bitline BL1 side) and a write value “0” of alower cell (bitline BL0 side). The write data state of each cell is setdepending on a power applying time which is defined by an overlap of thepositive logic write pulse H supplied to word line WL and the negativelogic write pulses L0, L1 supplied to bit lines BL0, BL1.

To write a logic “0” into a cell, use a short power application time,thereby setting the cell in its high resistance state; to write “1” intothe cell, use a long power application time, thereby setting the cell inits low resistance state.

According to the pulse application of FIG. 47, in the case of writingdata “00”, the upper and lower cells both exhibit the short powerapplication time so that these become in the high resistance statetogether.

In the case of data state “01”, the upper cell is with the short powerapplication time whereas the lower cell is with the long powerapplication time; thus, the upper cell becomes in the high resistancestate with the lower cell in the low resistance state.

In the case of data state “10”, the upper cell is with the long powerapplication time whereas the lower cell is with the short powerapplication time; thus, the upper cell becomes in the low resistancestate with the lower cell in the high resistance state.

In the case of data state “11” write, both the upper cell and the lowercell become longer in power application time so that both of them becomein the low resistance state.

FIG. 48 shows a practically implemented configuration of a multivaluedata write circuit 200 based on the combination of the long and shortpulses stated above. The write circuit 200 has a pulse generationcircuit 200 a operable to generate pulses with two types of pulsewidths, and a logic gate circuit 200 b which generates the positivelogic write pulse H and negative logic write pulses L0, L1 by combiningthe pulses obtainable from this pulse generator circuit 200 a.

An original pulse generation circuit 101 generates an original pulse(positive logic pulse) P0 with a pulse width T0. By inputting this pulseP0 and a pulse which is delayed by a delay circuit 102 to an AND gate103, a positive pulse P1 with a pulse width T1 is generated, which isshorter by a degree equivalent to the delay of such delay circuit.

By selecting a proper overlap of these two pulses P0, P1 in accordancewith the data to be written, let the negative logic write pulses L0, L1and the positive logic write pulse H generate with the required pulsewidths respectively. Here, C1, C0 are equivalent to the upper level bitand lower level bit of multivalue data described previously.

Owing to the use of an OR gate 105 for digitally computing a logical sumof C1, C0 and an AND gate 104 for digital calculation of a logicalproduct of its output and the pulse P0, the pulse P0 becomes thepositive logic write pulse H when at least one of C0, C1 is at “1”. Whenboth of C1, C0 are “0”, the AND gate 104 becomes off; thus, the pulse P1becomes the pulse H through the OR gate 109. This positive logic writepulse is given to the word line WL.

Additionally, with the use of NAND gates 106, 107 to which C1, C0 andthe pulse P0 are input respectively and also AND gates 108, 110 forproviding a product of their outputs and an inverted signal of the pulseP1, negative logic write pulses with their pulse widths whose exactlengths are determined in accordance with “1”, “0” of C1, C0 are to begiven to the bit lines BL1, BL0.

Next, in regard to the case of 8-value storage using the 3-layer cellarrays MA0-MA1 shown in FIG. 34, the way of write pulse applicationbased on a similar technique to that in the case of 4-value storage isshown in FIG. 49. The 8-value data “xxx” is indicated by possiblecombinations of the write value of a cell in the upper cell array MA2,the write value of a cell in the intermediate cell array MA1, and thewrite value of a cell in the lower cell array MA0. The waveforms ofwrite pulses which are given to a word line WL1 at the uppermost part, abit line BL1 shared by the cell arrays MA2, MA1, a word line WL0 sharedby the cell arrays MA1, MA0 and a bit line BL0 of the lowermost layerare as shown in FIG. 49.

The write pulses of FIG. 49 may be created by providing an extendedversion of the write circuit 200 of FIG. 48 and by logically combininglong/short pulses in a way similar to that stated supra. Unfortunately,the data states “101” and “111” are unavoidable to undergo degeneracywith unwanted equalization of the pulse widths as shown in FIG. 49. Inorder to write all the 8-value data items into a multivalue cell whilesetting every items in different states, the circuit of FIG. 48 is notsimply employable.

In contrast, FIG. 50 shows a write pulse generation scheme with theabove-stated degeneracy avoided. This eliminates any possible degeneracyby a method having the steps of making, as the positive and negativelogic pulses, two types of pulses which are the same in pulse width andyet different in time difference from each other, selectively combiningthem in a way corresponding to the data to be written, and controllingthe power pulse that is effectively applied to a respective one ofmultivalue cells.

Practically, make pulses each of which has a delay to the original pulsewith a long pulse width, in which the delay has a pulse width almosthalf of the original pulse width; then, utilize a combination of thesepulses. And, as shown in FIG. 50, with the negative logic write pulse L0to be given to the lowermost layer bit line BL0 as a reference, let thispulse be delayed by the half pulse width or be exactly in phase with thereference pulse to thereby generate the positive and negative logicwrite pulses H1, H0 and L1 which are given to the word lines WL1, WL0and bit line BL1, respectively.

As shown in FIG. 50, all the 8-value data are properly represented as tohave different pulse-overlap states from each other.

FIG. 51 is a configuration of a write circuit 200 which produces suchwrite pulses. This write circuit 200 is configured from a pulsegenerator circuit 200 a which generates two types of pulses that are thesame in pulse width and different in delay amount from each other, and alogic gate circuit 200 b which generates any required write pulses bycombination of such two types of pulses.

An original pulse generator circuit 201 is the one that generates apulse P0 with its pulse width T0, and a delay circuit 202 is a circuitwhich delays this pulse P0 by about T0/2. Here, time T0 is a time thatthe chalcogenide is possibly in its polycrystalline state when such timepulse is applied thereto, and T0/2 is chosen at about a specific lengthwhich causes it to be in its amorphous state.

A negative logic pulse which is an inverted version of the output pulseP0 of the original pulse generator circuit 201 by an inverter 203becomes the reference pulse to be given to the bit line BL0. In thefollowing, the relationship of the pulses being given to the word lineWL0, bit line BL1 and word line WL1 with respect to the pulse of the bitline BL0 is realized by execution of logical processing with C2, C1, C0indicative of 8-value write states (C2, C1, C0).

A set of AND gates 204, 205 is the one that selects whether an outputpulse of the pulse generator circuit 201 or a delayed pulse by the delaycircuit 202 in accordance with “1”, “0” of C0. Outputs of these ANDgates 204, 205 are taken out through an OR gate 210 to become a positivelogic write pulse H0 to be supplied to the word line WL0.

Similarly, a set of AND gates 207, 206 is the one that selects whetherthe output pulse of the pulse generator circuit 201 or the delayed pulseby the delay circuit 202 in accordance with the logic of C0, C1 by meansof an EXOR gate 213. Whereby, the negative logic write pulse L1 which isto be given to the bit line BL1 is obtained via a NOR gate 211.

A set of AND gates 208, 209 is the one that selects whether the outputpulse of pulse generator circuit 201 or the delayed pulse by delaycircuit 202 in accordance with the logic of C0, C1, C2 by means of EXORgates 214, 215, wherein outputs of them are passed through an OR gate212 to thereby obtain a positive logic write pulse H1 being given to theword line WL1.

As apparent from the foregoing, the method for delaying the write pulsesdepending upon the write data states is also applicable to the case of4-value storage stated previously. In other words, the pulse waveformsof FIG. 52 are usable in lieu of the pulse waveforms of FIG. 47. It canbe seen that while the negative logic write pulses L0, L1 to be suppliedto the bit lines BL and the positive logic write pulse H being suppliedto the word line are the same in pulse width, adjusting their overlapsin accordance with 4-value data results in application of write pulsesto cells, which pulses have a similar pulse width relationship to thatof FIG. 47.

FIG. 53 shows a write circuit 200 which realizes the write pulses ofFIG. 52. This is the same in configuration as the write pulse generatorunit which is used in the write circuit 200 in FIG. 51 and isoperatively associated with the bit line BL0, word line WL0 and bit lineBL1.

Further, based on the similar principles, FIG. 54 shows write pulsewaveforms in the case of 16-value storage by use of the 4-layer cellarrays shown in FIG. 40.

The write data states of 16 values are indicated by the write value of acell in the fourth cell array MA3, the write value of a cell in thethird cell array MA2, the write value of a cell in the second cell arrayMA1, and the write value of a cell in the first cell array MA0. In thiscase also, the negative pulse with respect to the lowermost layer bitline BL0 becomes a reference.

The pulses of word lines WL0, WL1 and bit lines BL1, BL2 are capable ofrepresenting all the 16 values by generating in combination of theoriginal pulse and its delayed pulse.

FIG. 55 shows a write circuit 200 for generation of write pulses such asthose of FIG. 54. Its main part configuration is similar to that of FIG.51; in addition thereto, AND gates 215, 216 and a NOR gate 217 areprovided as a pulse generation unit relative to a bit line BL2.

In accordance with the bit data C0, C1, C2, C3 of 16-value data to bewritten, that are input to each AND gate set (204, 205), (206, 207),(208, 209) and (215, 216), make adequate logic output signals C0′, C1′,C2′, C3′; thus, it is possible to obtain the write pulses of FIG. 54.

As described above, in the memory cells for storing therein thechalcogenide's crystalline state and amorphous state as data, it ispossible to perform data read and write operations based on the level ofa current flowing between a word line and a bit line, and also possibleto perform any intended read and/or write by controlling the level of avoltage between word and bit lines.

In the embodiments stated supra, the current detection scheme was usedfor data reading. In addition, for data writing in the case ofperforming multivalue storage by use of a plurality of cell arrays, suchthe technique was employed that performs “0”, “1” write based on thewrite pulse application time of each cell which stores multivalue datatherein.

By setting a cell in its molten state by pulse application of a shorttime and thereafter cooling it off, the cell becomes data “0” of thehigh resistance state. In other words, if the pulse application time isshort, then the cool-off after melting is fast resulting inestablishment of an amorphous high-resistance state. When performingpulse application for a longer time, the cell becomes data “1” in apolycrystalline low-resistance state.

However, with the above-described write principles, the resistancevalues that are different in order of magnitude or “digit” from oneanother are used; for this reason, a significant difference can takeplace in voltage—or current, thus energy—being applied to a cell duringwriting in a way depending on whether the data of the cell prior towriting is “0” or “1”. This will be explained by use of FIG. 56.

As shown in FIG. 56, assume that a voltage V is given in parallel to acell of data “0” (denoted by resistor R0) and a cell of data “1”(resistor R1) through load resistors r, respectively. The resistance R0is sufficiently larger in resistance than the resistance R1. Letting aresistance ratio of them be m=R0/R1, suppose that the load resistance isr=b·R1.

At this time, an all-cell current I is represented by Equation (1) whichfollows:I={1/(b+m)+1/(b+1)}V/R1  (1)

Power consumptions P0, P1 of the resistors R0, R1 are given by thefollowing Equations (2), (3), respectively:P0={m/(b+m)2}V2/R1  (2)P1={1/(b+1)2}V2/R1  (3)

By taking account of the above points, a careful consideration isrequired to write pulse designs in order to realize the so-calledoverwrite, which writes any desired data without depending upon theinitial state of a cell. More specifically, in order to set the cell inits high resistance state, heat at least part of the chalcogenide ofsuch cell up to its molten state or therearound, irrespective of whetherthe cell's original data is “0” or “1”; thereafter, rapidly cool itdown. To do this, it is preferable to give a large power at a heat atthe beginning of a short pulse application time period.

In the case of setting the cell in its low resistance state, arelatively long pulse application time is used, and maintain it in ahigh temperature state without bring the cell in the molten state. Withsuch procedure, it is possible to permit polycrystallization of the cellwhich has been in its amorphous state.

FIG. 57 shows a write pulse voltage raising or “boosting” circuit 250which is preferable for realization of the above-described data writing.Here, there is shown a pair of positive pulse booster (PP-BOOST) circuit250 a and negative pulse booster (NP-BOOST) circuit 250 b, whichcircuits are selectively boost the positive and negative write pulses H,L which are output from the write circuit 200 for multivalue storage ashas been explained in the previous embodiment(s) under certainconditions, respectively.

The positive logic write pulse H and negative logic write pulse L areselectively increased in potential by these booster circuits 250 a, 250b and then supplied through signal lines WPij, BPij to presentlyselected word line WL and bit line BL, respectively.

Negative logic pulses L1, L2 which are input to the positive pulsebooster circuit 250 a together with the positive logic pulse H are shownas those which are supplied to bit lines of the upper and lower cellarrays which share a word line to which the positive logic pulse H issupplied. Similarly, positive logic pulses H1, H2 which are input to thenegative pulse booster circuit 250 b along with the negative logic pulseL are shown as the ones that are supplied to word lines of the upper andlower cell arrays sharing the bit line to which the negative pulse L isgiven.

The positive and negative pulse booster circuits 250 a, 250 b each havecapacitors C1, C2 which are used for potentially boosting the signallines WPij, BPij through a charge-pump operation.

Reset-use NMOS transistors QN10 and PMOS transistor QP10 are provided atthe respective nodes N12, N22 of the capacitors C1, C2 on the signalline WPij, BPij sides thereof, which transistors are for holding them atVss and Vcc respectively in the non-select state. These resettransistors QN10, QP10 are such that upon generation of the positivelogic write pulse H and negative logic write pulse L, they are driven bythese pulses respectively to thereby turn off.

Diodes D12, D22 are connected to the nodes N12, N22, for charging thecapacitors C1, C2 up to a level of the positive logic pulse H (forexample Vcc), a level of the negative logic pulse L (for example Vss),respectively. The nodes N12, N22 are connected to the select lines WPij,BPij through diodes D13, D23 for use as transfer elements, respectively.Connected to these select lines WPij, BPij are diodes D11, D21 which areused to give thereto the positive logic write pulse H and the negativelogic write pulse L when selected. In the nonselect state, the nodesN11, N21 of the other of the capacitors C1, C2 are arranged to stay atVss and Vcc in response to receipt of outputs of an AND gate 254 a andan OR gate 254 b, respectively.

In the positive pulse booster circuit 250 a, a pulse H′ that is delayedwith a certain time from the positive logic pulse H enters one inputterminal of the AND gate 254 a; regarding the other input terminal, anoverlap state of the positive logic pulse H and negative logic pulsesL1, L2 is detected by an AND gate 251 a and a NOR gate 252 a; then, itsresult is input via a delay circuit 253 a.

In the negative pulse booster circuit 250 b, a pulse L′ that is delayedwith a certain time from the negative logic pulse L enters one inputterminal of the OR gate 254 b; as for the other input terminal, anoverlap state of the negative logic pulse L and positive logic pulsesH1, H2 is detected by an OR gate 251 b and a NAND gate 252 b; then, itsresult is input via a delay circuit 253 b. Let the delay time of thedelay circuit 253 a, 253 b be almost the same as the width T of eachwrite pulse.

An operation of the pulse booster circuit 250 thus arranged will beexplained using FIG. 58. In the nonselect state in which none of thepositive and negative write pulses are generated, in the positive pulsebooster circuit 250 a, the output of the AND gate 254 a is at Vss. Whenthe positive logic pulse H is generated, the node N12 of the capacitorC1 is charged by the diode D12 up to Vcc. Similarly in the nonselectstate, in the negative pulse booster circuit 250 b, the output of the ORgate 254 b is at Vcc. When the negative logic pulse L is generated, thenode N22 of the capacitor C2 is charged by the diode D22 at Vss.

As shown in FIG. 58, in such a case that the positive logic write pulseH with its pulse width T and the negative logic write pulses L1, L2 withthe same pulse width T are generated simultaneously, in the positivepulse booster circuit 250 a, the output of AND gate 254 a holds the lowlevel Vss so that the charge of capacitor C1 is not discharged in anyway. And, the positive logic write pulse H is simply given directly tothe signal line WPij through the diode D11.

In such a case that the negative logic write pulse L with the pulsewidth T and either one of the positive logic write pulses H1, H2 withthe same pulse width T are generated simultaneously, in the negativepulse booster circuit 250 b, the output of OR gate 254 b holds the highlevel Vcc so that any charge is hardly discharged, resulting in thenegative logic write pulse L being supplied directly to the signal lineBPij via the diode D21. In brief, in these cases, the charge pumpportion of any one of the pulse booster circuits 250 a, 250 b is madeinactive, and thus no pulse boost operations are available.

Next, in such a case that the positive logic write pulse H is generatedso that it is delayed relative to the negative logic write pulses L1 andL2 by the half T/2 of the pulse width thereof, a positive-directionboost operation of the positive logic write pulse H at the positivepulse booster circuit 250 a is performed. More specifically, in thepositive pulse booster circuit 250 a at this time, two inputs of the ANDgate 254 a become at the high level Vcc simultaneously for a time periodas determined by the delay circuit 253 a after the positive logic pulseH has become at its high level. Upon receipt of this, the output of ANDgate 254 a becomes “H”—that is, the potential level of the node N11 ofcapacitor C1 becomes Vcc; therefore, the node N12 is potentially boostedto greater than Vcc, causing this to be transferred through the diodeD13 to the signal line WPij.

In summary, the positive logic write pulse H to be given via the diodeD11 is potentially raised by the pumping action of the capacitor C1 andis then given to the signal line WPij. If the relationship between thepositive logic write pulse H1 or H2 and the negative logic write pulse Lis similar, then there is no such boost operation in the negative pulsebooster circuit 250 b.

Next, in such a case that the negative logic write pulse L is generatedso that this pulse is delayed to the positive logic write pulses H1, H2by the half T/2 of the pulse width thereof, a negative-direction boostoperation of the negative logic write pulse L at the negative pulsebooster circuit 250 b is performed. More specifically at this time, inthe negative pulse booster circuit 250 b, two inputs of the OR gate 254b become at the low level Vss simultaneously for a time period asdetermined by the delay circuit 253 b after the negative logic pulse Lbecomes at its low level. Whereby, the node N22 of the capacitor C2potentially drops down to less than Vss, causing this to be sent towardthe signal line BPij via the diode D23.

In short, the negative logic write pulse L that is given via the diodeD21 is boosted in the negative direction by the capacitor C2's pumpingaction and is then given to the signal line BPij. If the relationshipbetween the positive logic write pulse H and the negative logic writepulses L1 and L2 is similar, then such boost operation is unavailable inthe positive pulse booster circuit 250 a.

The pulse width T of the positive and negative logic write pulses H, Lshown in FIG. 58 is the pulse application time required for “1” datawriting. As described above, a boosted positive or negative pulse withits pulse width almost equal to T/2, which is obtained by control of anoverlap state of the pulses H or L, is given to a word line or a bitline required for “0” data write.

Therefore, using the pulse booster circuit 250 of FIG. 57 makes itpossible to boost, through pumping operations, either the high level orthe low level of the short pulse application time required for “0” datawrite. Thus, assembling such the pulse boost circuit 250 into the writecircuit makes it possible to reliably perform “0” data write withoutdepending upon the original data state.

Although practical examples of the write circuit equipped with the pulsebooster circuit stated above will be explained in such a manner that anexample which is applied to multivalue storage utilizingthree-dimensional (3D) multilayer cell arrays comes first, it would bereadily appreciated that the pulse boost circuit should not be limitedin application to such multivalue storage and may also be applied to thecase of performing two-value or binary data storage by means of atwo-dimensional (2D) cell array.

While the 3D multilayer cell arrays as has been explained in theprevious embodiments enable achievement of a large capacity of memory,it is preferable that certain consideration is taken to the dataprocessing architecture in connection with 3D cell accessing techniques.As an example thereof, an embodiment which makes up 3D cell blockspreferable for data searches will next be explained below.

FIG. 59 shows a configuration scheme of cell blocks each for use as aunit of data access, with respect to a three-dimensional (3D) cell array550 which consists essentially of the four layers of MA0-MA3 shown inFIG. 40. In FIG. 59, the 3D cell array 550 is shown as a rectangularsolid body, wherein this cell array block 550 is such that a pluralityof cell blocks 551 are partitioned by virtual boundary lines A, B whichextend vertically to the upper surface of it and cross or intersect eachother at right angles.

Here, an example is shown in which a single cell block 551 is defined asa rectangular structure which includes sixteen bit lines within a rangeas interposed by equally spaced virtual boundaries A extending inparallel to bit lines BL and also includes eight word lines in a rangeinterposed by equal-spaced virtual boundaries B parallel to the wordlines. Accordingly, the cell block 551 becomes a 3D assembly of 4×4×4=64cells.

In FIG. 59, the bit lines BL and word lines WL are shown merely relativeto one cell block 551 which is indicated by oblique lines. BL00 to BL03are the bit lines of a first layer cell array MA0; BL10-BL13 are sharedbit lines of a second layer cell array MA1 and a third layer cell arrayMA2; and, BL20-BL23 are the bit lines of a fourth layer cell array MA3.

In addition, WL00 to WL03 are shared word lines of the first layer cellarray MA0 and the second layer cell array MA1; WL10-WL13 are shared wordlines of the third layer cell array MA2 and the fourth layer cell arrayMA3.

FIGS. 60 and 61 show configurations of a bit line selecting circuit 50 aand a word line selecting circuit 50 b of the cell block 551 thusdefined in this way, respectively. The bitline selector circuit 50 a hasNMOS transistors QN00-QN03 for connecting the bit lines BL00-BL03 toselect lines BP00-BP03 respectively, NMOS transistors QN10-QN13 forconnecting the bit lines BL10-BL13 to select lines BP10-BP13respectively, and NMOS transistors QN20-QN23 for connecting the bitlines BL20-BL23 to select lines BP20-BP23 respectively.

The gates of these NMOS transistors are commonly driven together by aselect signal BS. The select signal BS is activated by an AND gate G10to become “H”. Whereby, it is possible to supply the required negativelogic write pulse to each bit line BLij through a select line BPij andvia its associative on-state NMOS transistor QNij in its own way.

The word-line selector circuit 50 b has PMOS transistors QP00-QP03 forconnecting the word lines WL00-WL03 to select lines WP00-WP03respectively and PMOS transistors QP10-QP13 for connecting the wordlines WL10-WL13 to select lines WP10-WP13 respectively.

The gates of these PMOS transistors are commonly driven together by aselect signal /WS. The select signal /WS is activated by a NAND gate G20to become “L”. Thus it is possible to supply the necessary positivelogic write pulse to each word line WLij through a select line WPij andvia its associative turned-on PMOS transistor QPij in its own way.

The select line BPij of FIG. 60 is provided and disposed in common for aplurality of cell blocks in a direction perpendicular to the bit lines.The select line WPij of FIG. 61 is provided in common for a plurality ofcell blocks in an orthogonal direction to the word lines.

Accordingly, it is possible to perform scanning of the bit lines and/orword lines within the cell block, by selecting any desired cell blockwith the AND gate G10 of FIG. 60 and the NAND gate of FIG. 61 as a blockdecode circuit and by using the negative logic write pulse and positivelogic write pulse which are given to the select lines BPij, WPij,respectively.

Although omitted in the selector circuits 50 a, 50 b of FIGS. 60 and 61,reset transistors are provided for holding each bit line and word lineat the high level Vcc and low level Vss in the nonselect state,respectively, as shown in FIG. 29 as an example.

Practically, as the form of data processing utilizing this cell blockconfiguration, three modes for performing a cell block data search areshown in FIGS. 62-64.

FIG. 62 shows a first data search mode. In this mode, 4 bits ofmultivalue information which are obtainable by simultaneous selection ofone of the word lines WL10-WL13 of the uppermost layer of a cell blockalong with four bit lines BL20-BL23 of the uppermost layer is handled askey string information, that is, identifier information as preset for acontent search. While holding these four bit lines BL20-BL23 in theselect state, sequentially set the uppermost layer word lines WL10-WL13in the select state, whereby it is possible to conduct a search ofcontent reference data by scanning the key string.

Once the key string information is coincided (hit) with the preset data,data may be read out in accordance with the data structure within thecell block.

In FIG. 62, it is assumed that the required data is present in the cellsimmediately beneath the hit position; and, a process for sequentiallyaccessing these cells is shown herein. The way of setting the key stringat the uppermost layer is a mere example: the string may be set in anyone of the layers involved.

Also, regarding the way of accessing for readout the data within thecell block in the hit event, a variety of ones are selectable inrelation to a sense amplifier configuration used. In brief, thewithin-the-cell-block data access method is determinable depending uponhow sense amp circuitry is connected to each-cell-block-common selectlines BPij, WPij connected to the word and bit lines within the cellblock.

FIG. 63 shows a second data search mode. In this mode, conduct a datasearch by selecting one from among the bit lines BL20-BL23 of theuppermost layer of the cell block, simultaneously selecting four wordlines WL10-WL13 of the uppermost layer, and then simultaneously read 4bits of multivalue information as the key string information. Whileholding the four word lines WL10-WL13 in the select state, sequentiallyset the bit lines BL20-BL23 of the uppermost layer in the select stateand then scan the key string, thus making it possible to search thecontent reference data. When the key coincides, then read data inaccordance with the data structure within the cell block.

FIG. 63 assumes that requisite data is present in the cells immediatelyunderlying the hit position to show a procedure for accessing thesecells sequentially. Setting the key string at the uppermost layer is amere example, and this may be set in any one of the layers.Additionally, regarding the technique for accessing for readout the datawithin the cell block in the hit event, a variety of ones may beselected in relation to the sense amp configuration used. This is thesame as the case of FIG. 62.

FIG. 64 shows a third data search mode. In this mode, conduct a datasearch by simultaneously reading as the key string information that are4 bits of multivalue information selected by three bit lines in the cellblock stack direction (thickness direction) and two word lines in thesame stack direction.

For example, while retaining three bit lines BL00, BL10, BL20 in theselect state, sequentially set pairs of multilayer-direction word lines(WL00, WL10), (WL01, WL11), (WL02, WL12), (WL03, WL13) in the selectstate and then scan the key string to thereby enable execution of asearch for the content reference data. Whenever the key exhibits acoincidence, read data in accordance with the data structure within thecell block.

FIG. 64 assumes that requisite data is present at cells which arealigned in the word-line direction at the hit position and shows aprocedure for sequentially accessing these cells. The way of setting thekey string at which cross-sectional position of the cell block is mereoptional matter. Also regarding how to access for readout the datawithin the cell block in the hit event, a variety of methods may beselected in relation to the sense amp configuration used. This is thesame as the cases of FIGS. 62 and 63.

As apparent from the foregoing, in the example above, each cell block isstructured from 64 cells and is capable of simultaneously scanning andreading data in units of 4 bits at a time. With the use of such cellblock arrangement, it is possible to achieve the content referencememory that performs data storage in the form of 4-bit 16-value datawhile offering enhanced data searchability with reduced complexities.

Data writing is such that free write is enabled by appropriatelydesigning the way of giving write pulses to the select lines BPij, WPij.For example, it is possible to make up an image memory which is easy inmask write for partial modification of image data or the like.

When such the cell block is arranged in this way, sense amplifiercircuits are provided between the respective select lines BLij and WLijwhich are provided in common for a plurality of cell blocks in FIGS. 60and 61. Practically, the sense amplifier circuit shown in FIG. 30 orFIG. 42 is used with no specific changes added thereto.

In the case of performing simultaneous 4-bit reading within the samelayer, the sense amp circuit of FIG. 30 may be provided on a per-cellbasis. In the case of simultaneously reading 4 cells which belong todifferent layers, the sense amp circuit of FIG. 42 is employable in viewof the fact that the word lines and bit lines are shared among such fourcells.

FIG. 65 shows a configuration of a write circuit 200 which is applied inthe case of using the search mode of FIG. 64 in the above-stated cellblock 551. A principal or core part of this write circuit 200 is thesame as that of FIG. 55 used in the case of performing 16-value storageby means of the three-layer cell arrays stated previously.

Positive logic write pulses H0n and H1n are the ones that are suppliedto word lines through select lines WPij; Negative logic write pulsesL0n, L1n and L2n are supplied to bit lines via select lines BPij. Here,suffix “n” is indicative of the position of four bit lines aligned inthe wordline direction within the cell block 551 of FIG. 64, where n=0to 3.

The positive logic write pulses H0n, H1n and the negative logic writepulses L0n, L1n, L2n correspond to the positive logic write pulses H0,H1 and the negative logic write pulses L0, L1, L2 shown in FIG. 54,respectively. All of these pulses are with a constant pulse width, andselecting an overlap state thereof results in a substantially shortpulse width at the portions of “0” data, thereby enabling achievement of16-value data writing.

And in FIG. 65, the pulse booster circuit 250 which has been explainedin FIG. 57 is added in order to selectively boost each write pulse inaccordance with the data state. More specifically, positive pulsebooster circuits 250 a are added with respect to the positive logicwrite pulses H0n, H1n respectively; negative pulse booster circuits 250b are added relative to the negative logic write pulses L1n, L2nrespectively. The negative logic write pulse L0n for use as a referenceis directly transferred to a signal line BP0n without via any voltagebooster circuit.

An “L” input indicated at the negative pulse booster circuit 250 b withrespect to the negative logic write pulse L2n is for giving either oneof the two negative logic write pulses L1, L2 shown in FIG. 57 as“L”-fixed data because of the absence of any further overlying layer'scell array. The result of addition of such pulse booster circuit 250 isthat the pulse waveforms of the select lines WP0n, WP1n and BP0n, BP1n,BP2n, to which the positive logic write pulses H0n, H1n and negativelogic write pulses L0n, L1n, L2n are transferred respectively, are asshown in FIG. 66.

As apparent from comparison with FIG. 54, the initial portions withinthe width of the positive logic write pulses and negative logic writepulses are selectively boosted in connection with the relationshiprelative to the widths of upper and lower pulses. More specifically, thepositive logic write pulses H0n, H1n, which are given to the selectlines WP0, WP1n coupled to the word lines WL0, WL1, are such that when adelay of half pulse width occurs with respect to two negative logicwrite pulses being sent to bit lines putting these word linestherebetween, their first half rise-up portions are boosted in thepositive direction.

The negative logic write pulses L1n, L2n that are given to the selectlines BP1n, BP2n coupled to the bit lines BL1, BL2 are such that when adelay of half pulse width occurs with respect to the positive logicwrite pulse being given to either one of these upper and lower bitlines, their first half fall-down portions are boosted in the negativedirection.

With such an arrangement, significant energy is given to a “0”data-written cell in the case of multivalue storage within a short pulseapplication time period; thus, it is possible to perform “0” writereliably without any failures. During “1” write based on a long pulsewidth, at least second half part of such pulse width stays less incurrent amount so that the cell is no longer cooled off rapidly. Thus,annealing is done to obtain the crystalline state.

In the embodiments discussed above, there have been explained themultilayer cell array structures of phase-change memory which facilitateachievement of stacked cells and higher densities by use of diodes—inparticular, Schottky diodes—as selector elements, and further themultivalue phase-change memory using stacked cell arrays. However, amultivalue memory is also useful for achievement of a substantiallylarge capacity of memory without the use of stacked cell arrays.Exemplary configurations of such multivalue phase-change memory will beexplained below.

FIG. 67 shows a configuration example of a 16-value memory with fourphase-change layer-made variable resistive elements VR being commonlyconnected together to a word line WL through a select transistor QP10.The variable resistive elements VR are connected at one-end terminals tobit lines BL0-BL3, respectively. Here, the select transistor QP10 is aPMOS transistor as driven by a select signal /WS, which stays at “H” atthe time of non-selection.

With the use of this configuration, data read is performed by turningthe select transistor QP on, letting a current flow between the wordline WL and each bit line BL0-BL3, and then detecting the respectivecurrents of the bit lines. By combining the high resistance state (data“0”) and low resistance state (data “1”) of the variable resistiveelements VR, sixteen different values are representable.

Data write is performed, as shown in FIG. 68, in such a manner thatduring on-state of the select transistor QP10, data bits “1”, “0” arewritten depending on the overlap width of a positive logic pulse beinggiven to the word line WL and a negative logic pulse being given to eachbit line BL0-BL3. The example of FIG. 68 shows the case of writing “0”,“1”, “0”, “1” into the cells of bit lines BL0, BL1, BL2, BL3respectively by giving negative logic pulses with a pulse width almosthalf of that of the positive logic pulse to the bit lines BL0, BL2 whilegiving negative logic pulses with the same pulse width as the positivelogic pulse to the bit lines BL1, BL3.

FIG. 69 shows a layout of the multivalue cells shown in FIG. 67. FIG. 70shows its cross-sectional view taken along line I-I′. Using an n-typesilicon substrate 300, a PMOS transistor QP10 is formed which has a gateelectrode 302 and source/drain diffusion layers 303, 304. The gateelectrode 302 becomes a select signal line. The surface in which thetransistor QP10 is formed is covered with an interlayer dielectric film305, in which contact holes are defined for burying therein four metalplugs 306 which are connected to the source diffusion layer 303.Further, a chalcogenide layer 307 is formed on this interlayerdielectric film 305, on which layer bit lines 308 are formed. The bitlines 308 are covered with an interlayer dielectric film 309, on whichword lines are formed including a word line 310 connected to the draindiffusion layer 304.

The multivalue memory of FIG. 67 may alternatively be arranged by use ofa diode SD in place of the select transistor QP as shown in FIG. 71. Inparticular, when letting the diode SD be a Schottky diode to be formedby using a semiconductor film, it is also possible to readily form astructure with this multivalue cell array stacked over others whileusing an electrically insulative dielectric substrate in the way asexplained previously.

FIG. 72 shows an exemplary structure with the multivalue cell array ofFIG. 71 stacked over others, and FIG. 73 shows an equivalent circuit ofsuch stacked structure. Cell arrays MA0, MA1 are stacked above a siliconsubstrate 400 covered with a dielectric film 401 while sharing bit lines(BL) 408. The lower cell array MA0 has word lines (WL0) 402 a formed onthe dielectric film 401, more than one diode SD formed thereabove by asemiconductor film, and bit lines 408 formed thereover. Four bit lines408 share the diode SD.

The diode SD is formed of an n-type silicon layer 404 a and a metalelectrode 403 a for forming a Schottky barrier. An n+-type layer 405 ais formed at the surface of n-type silicon layer 404 a; and further, anohmic electrode 406 a is formed. On this diode SD, a chalcogenide layer407 a is formed, and a plurality of bit lines (BL) 408 are formed onthis chalcogenide layer 407 a. The numerals of corresponding parts ofthe upper and lower cell arrays MA0, MA1 are added “a”, “b” fordistinguishing over each other; thus, while a detailed explanation iseliminated herein, the upper cell array MA1 is formed which is oppositein layer stacking order to the lower cell array MA0 and which shares thebit lines.

With the employment of the stacked structure above, it is possible toachieve an extra-large capacity of memory. It is also possible bydeveloping the stacked structure of FIG. 72 to stack or multilayer athird cell array which shares the word lines 402 b; furthermore, it ispossible by repeated use of similar stacked layers to obtain multilayercell array stacked structures.

FIG. 74 is an example which simply further stacks the multivalue cellarray of FIG. 71 without causing the bit lines or word lines to beshared between layers. Although the numerals at corresponding portionsof the upper and lower cell arrays MA0, MA1 are added “a”, “b” fordistinguishing from each other, the both are isolated from each other byan interlayer dielectric film 410 and stacked in the same film stackorder. With this multilayer structure also, it is possible to realize alarge capacity of memory.

Additional Embodiment

Another embodiment will be explained below. The memory device accordingto an additional embodiment explained below is a resistance changememory, which stores a high resistance state and a low resistance stateas information data, and is referred to as a phase change memory in awide sense. Therefore, the description in the above-described embodimentwith reference to FIGS. 1 to 74 may be effective as it is in theembodiment described below with the exception of the recording layer'smaterial and recording mechanism.

A recording layer constituting a variable resistance element in thisembodiment is formed of a composite compound, which contains at leastone type of transition element, and has a cavity site capable of housinga metal ion (cation) diffused from an electrode.

As the electrode serving as a cation source, which supplies a metal ionto be housed in a cavity site in the recording layer, an Ag electrode isemployed typically. In place of the Ag electrode, usable metals are asfollows: Cu, Ni, Zn, Mg and Co.

The recording layer is, for example, composed of a two-element systemmetal oxide with an oxide-lack model, or a three-element system metaloxide with an oxide-lack model. The former compound is one selected fromTiO_(x), CuO_(x), MnO_(x), FeO_(x), CoO_(x) and the like; and the lattercompound is one selected from SrTiO_(x), BiTiO_(x), SrZrO_(x) and thelike each with a perovskite structure. In the above-described compounds,the ratio “x” is set to be smaller than stoichiometric one.

Further, generally explaining, the recording layer may be composed ofone of:

-   i. L_(x)MO₂

where, “L” is a cation element housed in the cavity site; “M” is atleast one element selected from Ti, Ge, Sn, V, Cr, Mn, Fe, Co, Ni, Nb,Ta, Mo, W, Re, Ru and Rh; and “O” is oxygen. Molar ratio “x” is selectedto satisfy 1≦x≦2.

-   ii. L_(x)MO₃

where, “L” is a cation element housed in the cavity site; “M” is atleast one element selected from Ti, Ge, Sn, V, Cr, Mn, Fe, Co, Ni, Nb,Ta, Mo, W, Re, Ru and Rh; and “O” is oxygen. Molar ratios “x” isselected to satisfy 1≦x≦2.

-   iii. L_(x)MO₄

where, “L” is a cation element housed in the cavity site; “M” is atleast one element selected from Ti, Ge, Sn, V, Cr, Mn, Fe, Co, Ni, Nb,Ta, Mo, W, Re, Ru and Rh; and “O” is oxygen. Molar ratios “x” isselected to satisfy 1≦x≦2.

-   iv. L_(x)MPO_(y)

where, “L” is a cation element housed in the cavity site; “M” is atleast one element selected from Ti, Ge, Sn, V, Cr, Mn, Fe, Co, Ni, Nb,Ta, Mo, W, Re, Ru and Rh; “P” is phosphorous; and “O” is oxygen. Molarratios “x” and “y” are selected to satisfy 0.3≦x≦3 and 4≦y≦6,respectively.

In these compounds, one of the following crystalline structures may beemployed.

-   -   Spinel structure    -   Hollandite structure    -   Ramsdelite structure    -   Ilmenite structure    -   Wolframite structure    -   Anatase structure    -   Brookite structure    -   Pyrolusite structure    -   ReO₃ structure    -   MoO₃ structure    -   MoO_(1.5)PO₄ structure    -   TiO_(0.5)PO₄ structure    -   FePO₄ structure    -   βMnO₂    -   γMnO₂    -   λMnO₂    -   Perovskite structure

In the above described composite compound, preferable ones are asfollows: spinel type transition metal oxide (AxM₂O₄); ilmenite typetransition metal oxide (AxMO₃); wolframite type transition metal oxide(AxMO₄); hollandite type transition metal oxide (A_(x)MO₂); ramsdelitetype transition metal oxide (A_(x)MO₂); wolframite type transition metaloxide (AxMO₄); perovskite type transition metal oxide (AxMO₃); andtwo-element system transition metal oxide (MO_(x)). In these compounds,the ratio “x” is set to be smaller than stoichiometric one.

In FIGS. 78 to 83, there are shown combination examples of elementstogether with circles with respect to compound examples usable in thisembodiment.

FIG. 75 shows a variable resistance element (or unit) 500, in which theabove-described composite compound is used as a recording layer 502.Explaining in detail, the recording layer 502 is a TiO_(x) layer, andsandwiched by electrode layers 501 and 503. One of the electrodes 501and 503, for example, the lower electrode 501 is an Ag electrode; andanother electrode 503 serves as a protect layer.

A small black cycle in the recording layer 502 denotes a transitionelement ion (Ti ion in this example); a large white cycle denotes anegative ion, i.e., oxygen ion; and a small white cycle denotes adiffusion ion, i.e., Ag ion diffused from the electrode 501.

FIG. 75 shows an example, in which a reset state is a low resistancestate (i.e., a stable state in this case), in which Ag ion has beendiffused in the recording layer 502; and a set state is a highresistance state. However, it should be noted that the reset and setstates may be defined reverse to those in this example. Further, theabove-described “set” and “reset” are defined as: one of them is“write”; and the other is “erase”.

An initial state of the recording layer 502 is such a state that cavitysites therein are empty, and it is defined as the set state here.

In the initial state, a voltage is applied to the recording layer 502 insuch a manner that electrodes 501 and 503 serve as anode and cathode,respectively. With this voltage application, a large pulse currentflows, thereby generating Joule-heat in the recording layer 502.

With this voltage application and Joule-heat, Ag ions are injected fromthe electrode 501 to be diffused, drifted and housed in the cavity sitesin the recording layer 502. As a result, Ag ions (metal ions, i.e.,cation ions) become excessive in the recording layer 502, and it will beset in the low resistance state (i.e., reset state).

In the reset state, when a voltage is applied in such a manner that theelectrodes 501 and 502 serve as cathode and anode, respectively, Ag ionshoused in the cavity sites of the recording layer 502 may be drifted andrestored to the electrode 501. As a result, the recording layer 502 isset in the high resistance state (i.e., set state) with the cavity sitesbeing empty.

Data defined by the high resistance state and the low resistance statemay be read in such a manner as to supply a current pulse to therecording layer 502 and detect the resistance value thereof. It shouldbe noted here that it is required of the current pulse used at a readtime to be too small to cause resistance change of the recording layer502.

To achieve the above-described operation principle in practice, itshould be confirmed that no reset operation occurs at room temperature(i.e., retention time is sufficiently long); and power consumption ofthe reset operation is sufficiently small.

These conditions can be obtained by finding out a suitable moving pathof the Ag ions diffused or drifted in the recording layer 502 withreference to the crystal structure thereof.

On the other hand, it is preferable to make the electrodes 501 and 503hardly oxidized. In addition, it is desired that an electrode materialhas no ion conductivity. For this purpose, it is effective that, forexample, the electrode 503 is formed of an electrically conductivenitride or an electrically conductive oxide.

Further, as shown in FIG. 76, it is preferable that a barrier (orbuffer) layer 505 is disposed between the electrodes 501 and therecording layer 502 for preventing reaction between Ag electrode 501 andthe recording layer 502. The barrier layer 505 is, for example, formedof an electrically conductive nitride or electrically conductive oxidelayer. In this case, it is required of the barrier layer 505 to beselected as to hardly disturb Ag ion transferring.

Among the above-described nitride and oxide electrode materials, LaNiO₃is the most preferable material in view of comprehensive performanceconsidering good electrical conductivity or the like. Further, thefollowing electrode materials will be used as the electrode 503.

-   -   MN

In the formula, “M” is at least one element selected from the groupconsisting of Ti, Zr, Hf, V, Nb and Ta; and “N” is nitrogen.

-   -   MO_(x)

In the formula, “M” is at least one element selected from the groupconsisting of Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zr, Nb, Mo, Ru, Rh, Pd, Ag,Hf, Ta, W, Re, Ir, Os and Pt; and “O” is oxygen. The molecular ratio “x”is set to satisfy 1≦x≦4.

-   -   AMO₃

In the formula, “A” is at least one element selected from the groupconsisting of La, K, Ca, Sr, Ba and Ln; “M” is at least one elementselected from the group consisting of Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zr,Nb, Mo, Ru, Rh, Pd, Ag, Hf, Ta, Re, W, Ir, Os and Pt; and “O” is oxygen.

-   -   A₂MO₄

In the formula, “A” is at least one element selected from the groupconsisting of K, Ca, Sr, Ba, and Ln; “M” is at least one elementselected from the group consisting of Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zr,Nb, Mo, Ru, Rh, Pd, Ag, Hf, Ta, W, Re, Ir, Os and Pt; and “O” is oxygen.

A protective layer may also be employed in place of the electrode 503.In this case, the protective layer is formed of an insulator orconductive material.

To efficiently carry out heating of the recording layer 502 in the resetoperation, for example as shown in FIG. 77A, it is preferable to providea heater layer 504 with a resistivity of 10⁻⁵/Ω-cm or more at the sideof upper electrode 503. Alternatively, such the heater layer 504 may bedisposed on the side of the lower electrode 501 as shown in FIG. 77B.Further, as shown in FIG. 77C, heater layers 504 a and 504 b may beformed on the sides of the electrodes 501 and 503, respectively.

Note here that in case the heater layer 504 is disposed on the side ofAg electrode 501, it is required of it to be Ag ion transferable.

Further, the recording layer 502 may possess a plurality ofmicrostructures that have in common a continuous crystalline pathbetween the electrodes 501 and 503 in at least a part of the recordinglayer 502. The recording layer may consist of a single-crystal filmcontaining no grain boundary or a crystal film, the grain size of whichis smaller than the lateral size of a memory cell.

A polycrystalline or amorphous film may also be used as the recordinglayer 502 if the film contains at least one columnar crystalline regionthat forms a continuous crystalline path between the electrodes. Thisembodiment remains effective regardless of the way in which thecrystalline path between the electrodes 501 and 503 is formed. Therecording layer 502 may, for example, be deposited during devicemanufacture in an amorphous or nanocrystalline form, and the columnarcrystalline region is formed by local Joule heating during an initialforming stage of the device under a suitable bias current. As a result,the set/reset operation described above will be achieved by use of thecation movement in the crystalline regions of the recording layer 502.

1. A resistance change memory device comprising a substrate; firstwiring lines formed above the substrate; second wiring lines formedabove the substrate to cross the first wiring lines and beingelectrically insulated therefrom; and memory cells disposed atrespective crossing points of the first wiring lines and the secondwiring lines, one ends thereof being connected to the first wiring linesand the other ends being connected to the second wiring lines, whereinthe memory cell includes, a variable resistance element to store asinformation a resistance value; and a diode connected in series to thevariable resistance element, the variable resistance element includes, arecording layer formed of a composite compound containing at least onetransition element and a cavity site to house a cation ion; andelectrodes formed on the opposite sides of the recording layer, one ofthe electrodes serving as a cation source in a write or erase mode tosupply a cation to the recording layer to be housed in the cavity sitetherein, and the device further comprises: selector circuits to fix thefirst wiring lines to a state lower in potential than the second wiringlines when nonselected and to selectively supply positive and negativelogic pulses to the first and second wiring lines respectively duringdata reading or writing.
 2. The resistance change memory deviceaccording to claim 1, wherein each the selector circuit includes, afirst select transistor to transfer the positive logic pulse to thefirst wiring line; a second select transistor to transfer the negativelogic pulse to the second wiring line; a first reset-use transistor tohold the first wiring line at a first potential level when nonselected;and a second reset-use transistor to hold the second wiring line at asecond potential level higher than the first potential level whennonselected.
 3. The resistance change memory device according to claim1, further comprising: a sense amplifier circuit to compare a current ofthe memory cell selected by the selector circuits to a reference valueto thereby detect data.
 4. The resistance change memory device accordingto claim 3, wherein the sense amplifier circuit comprises at least oneof: a first current detection circuit to compare to a reference value acurrent flowing in the first wiring line when the positive and negativelogic pulses are given to the first and second wiring lines respectivelyand to perform level determination; and a second current detectioncircuit to compare to a reference value a current flowing in the secondwiring line when the positive and negative logic pulses are given to thefirst and second wiring lines respectively and to perform leveldetermination.
 5. The resistance change memory device according to claim3, wherein the sense amplifier circuit comprises: a dummy cell havingits resistance value midway between a high resistance state and a lowresistance state of the memory cells; a first resistor interposedbetween the first wiring line and a first power supply line to which thepositive logic pulse is given; a second resistor interposed between thesecond wiring line and a second power supply line to which the negativelogic pulse is given; a third resistor interposed between one end of thedummy cell and the first power supply line; a fourth resistor interposedbetween the other end of the dummy cell and the second power supplyline; a first operational amplifier to compare between an intermediatetap output voltage of the first resistor and a voltage at a connectionnode of the third resistor and the dummy cell; and a second operationalamplifier to compare between an intermediate tap output voltage of thesecond resistor and a voltage at a connection node of the fourthresistor and the dummy cell.
 6. The resistance change memory deviceaccording to claim 1, further comprising: a write circuit to supply apositive logic pulse and a negative logic pulse to the first wiring lineand the second wiring line respectively with respect to a memory cell asselected by the selection circuit, to write the low resistance state dueto complete overlap of pulse widths of the positive logic pulse andnegative logic pulse, and to wire the high resistance state due topartial overlap of pulse widths of the positive logic pulse and negativelogic pulse.
 7. The resistance change memory device according to claim6, wherein the write circuit has a pulse voltage booster circuit toselectively boost either one of the positive logic pulse and thenegative logic pulse at an overlap portion of pulse widths of thepositive logic pulse and negative logic pulse when writing the highresistance state.
 8. The resistance change memory device according toclaim 1, further comprising: a write circuit to write, based on writepulse width control, multi-level information into a plurality ofsimultaneously accessed memory cells of the plurality of cell arrays,the multi-level information being represented by combination of the highresistance state and the low resistance state within the plurality ofsimultaneously accessed memory cells.
 9. The resistance change memorydevice according to claim 8, wherein the write circuit comprises: apulse generation circuit to generate two types of pulses different inpulse width from each other; and a logic gate circuit to determine inaccordance with the multi-value information the time width of a writepulse being given between the simultaneously selected first and secondwiring lines of a cell array by selection and combination of two typesof pulses as output from the pulse generation circuit.
 10. Theresistance change memory device according to claim 8, wherein the writecircuit comprises: a pulse generation circuit to generate two types ofpulses with a constant pulse width and with a time differencetherebetween; and a logic gate circuit to determine in accordance withthe multi-value information the time width of an overlap of the positivelogic pulse and the negative logic pulse being given to thesimultaneously selected first and second wiring lines of a cell arrayrespectively by selection and combination of the two types of pulses asoutput from the pulse generation circuit.
 11. The resistance changememory device according to claim 10, wherein the write circuitcomprises: a pulse voltage booster circuit to selectively boost thepositive logic pulse or the negative logic pulse being output from thelogic gate circuit in accordance with the multi-level information to bewritten.
 12. A resistance change memory device comprising: asemiconductor substrate; semiconductor layers formed in thesemiconductor substrate so that these are arrayed in a matrix form whilebeing partitioned by an element isolation dielectric film; diodes eachformed at its corresponding semiconductor layer with a metal electrodeas a terminal electrode, the metal electrode being formed at part of asurface of each the semiconductor layer; first wiring lines provided tocommonly connect the diodes as arrayed in one direction of the matrix;an interlayer dielectric film covering the first wiring lines; metalplugs buried in space portions of the first wiring lines of theinterlayer dielectric film and being in ohmic contact with each thesemiconductor layer; variable resistance elements with a recoding layerformed above the interlayer dielectric film to have a bottom surface incontact with the metal plugs; and second wiring lines provided to crossthe first wiring lines while being in contact with an upper surface ofthe recording layer, wherein the variable resistance element includes, arecoding layer formed of a composite compound containing at least onetransition element and a cavity site for housing a cation ion; andelectrodes formed on the opposite sides of the recording layer, one ofthe electrodes serving as a cation source in a write or erase mode tosupply a cation to the recording layer to be housed in the cavity sitetherein.
 13. The resistance change memory device according to claim 12,wherein the composite compound serving as the recording layer is oneselected from the group consisting of: spinel type compound (AM₂O₄);illumenite type compound (A_(x)MO₃); wolframite type compound(A_(x)MO₄); hollandite type compound (A_(x)MO₂); ramsdelite compound(A_(x)MO₂); two-element system metal oxide selected from TiO_(x),CuO_(x), MnO_(x), FeO_(x) and CoO_(x); and perovskite type compoundselected from SrTiO_(x), BiTiO_(x) and SrZrO_(x) (where, “x” is set tobe smaller than stoichiometric one), and the electrode serving as thecation source is formed of one selected from Ag, Cu, Ni, Zn, Mg and Co.14. The resistance change memory device according to claim 1, whereinthe composite compound serving as the recording layer is one selectedfrom the group consisting of: spinel type compound (AM₂O₄); illumenitetype compound (A_(x)MO₃); wolframite type compound (A_(x)MO₄);hollandite type compound (A_(x)MO₂); ramsdelite compound (A_(x)MO₂);two-element system metal oxide selected from TiO_(x), CuO_(x), MnO_(x),FeO_(x) and CoO_(x); and perovskite type compound selected fromSrTiO_(x), BiTiO_(x) and SrZrO_(x) (where, “x” is set to be smaller thanstoichiometric one), and the electrode serving as the cation source isformed of one selected from Ag, Cu, Ni, Zn, Mg and Co.